Next generation XUV source for time-resolved nano-ARPES and PEEM

利用足够高的光子通量的XUV光子源进行纳米空间分辨率成像和纳米arpes是Kakenhi提出的目标。这样的分辨率允许对材料电子结构的纳米级变化进行完整的研究。在本财政年度，我们已经完成了新的XUV光束线的建立，它提供了4 × 1018光子/秒/平方厘米的通量密度，比我们以前所做的高出两个数量级。我们把这束线与电子显微镜连接起来。在我们最初的测试运行中，我们证明了我们能够用XUV光子进行成像，达到优于100nm的空间分辨率，我们也可以用几微米的空间分辨率进行APRES。我们也开始了对扭曲二维材料的研究，初步结果表明我们可以在云纹结构中成像和解析不同的铁电畴。

Nanoscale spatial resolution imaging and nano-ARPES with the XUV photon source with high enough photon flux has been the goal of this Kakenhi proposal. Such a resolution allows the complete investigation of the nanoscale variations in the electronic structure of a material. In this fiscal year, we have finished setting up a new XUV beamline, which provides a flux density of 4 x1018 photons/sec/cm2 that is two-order in magnitude higher than what we have previously done. We have coupled this beamline to an electron microscope. In our initial test runs, we demonstrated that we are capable of doing imaging with XUV photon reaching a spatial resolution better than 100nm and we can also perform APRES with few micron spatial resolution. We have also started a study on twisted 2D materials, preliminary result shows that we can image and resolve different ferroelectric domains in the moire structure.