Next generation XUV source for time-resolved nano-ARPES and PEEM

纳米尺度的空间分辨率成像和具有足够高光子通量的XUV光子源的纳米ARPES一直是这个Kakeni提议的目标。这样的分辨率允许对材料电子结构的纳米级变化进行完整的研究。在本财年，我们已经完成了新的XUV光束线的设置，它提供了4x1018光子/秒/厘米2的通量密度，比我们以前所做的高出两个数量级。我们把这条光束线连接到一个电子显微镜上。在我们最初的试运行中，我们证明了我们能够在XUV光子达到优于100 nm的空间分辨率的情况下进行成像，并且我们也可以进行几个微米的空间分辨率的APARE。我们还开始了对扭曲二维材料的研究，初步结果表明，我们可以成像和分辨莫尔结构中不同的铁电畴。

Nanoscale spatial resolution imaging and nano-ARPES with the XUV photon source with high enough photon flux has been the goal of this Kakenhi proposal. Such a resolution allows the complete investigation of the nanoscale variations in the electronic structure of a material. In this fiscal year, we have finished setting up a new XUV beamline, which provides a flux density of 4 x1018 photons/sec/cm2 that is two-order in magnitude higher than what we have previously done. We have coupled this beamline to an electron microscope. In our initial test runs, we demonstrated that we are capable of doing imaging with XUV photon reaching a spatial resolution better than 100nm and we can also perform APRES with few micron spatial resolution. We have also started a study on twisted 2D materials, preliminary result shows that we can image and resolve different ferroelectric domains in the moire structure.