Next generation XUV source for time-resolved nano-ARPES and PEEM

用于时间分辨纳米 ARPES 和 PEEM 的下一代 XUV 源

• 批准号: 22K18270
• 负责人: Dani Keshav
• 金额: $ 16.47万
• 依托单位: Okinawa Institute of Science and Technology Graduate University
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for Challenging Research (Pioneering)
• 财政年份: 2022
• 资助国家: 日本
• 起止时间: 2022-06-30 至 2025-03-31
• 项目状态: 未结题
• 来源: https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-22K18270/
• 关键词: Extreme UV light source; High order; harmonic generation; XUV-PEEM; Nano-APRES; Twisted 2D materials; Moire pattern; Extreme Ultraviolet; Higher Harmonic; Angle resolved; photoemission; electron microscopy

Nanoscale spatial resolution imaging and nano-ARPES with the XUV photon source with high enough photon flux has been the goal of this Kakenhi proposal. Such a resolution allows the complete investigation of the nanoscale variations in the electronic structure of a material. In this fiscal year, we have finished setting up a new XUV beamline, which provides a flux density of 4 x1018 photons/sec/cm2 that is two-order in magnitude higher than what we have previously done. We have coupled this beamline to an electron microscope. In our initial test runs, we demonstrated that we are capable of doing imaging with XUV photon reaching a spatial resolution better than 100nm and we can also perform APRES with few micron spatial resolution. We have also started a study on twisted 2D materials, preliminary result shows that we can image and resolve different ferroelectric domains in the moire structure.

纳米级空间分辨率成像和具有足够高光子通量的XUV光子源的纳米ARPES一直是Kakenhi提案的目标。这样的分辨率允许在材料的电子结构中的纳米级变化的完整调查。在本财政年度，我们完成了一条新的XUV光束线的建立，其通量密度为4 x1018光子/秒/平方厘米，比我们以前所做的高出两个数量级。我们把这条光束线和电子显微镜连接起来。在我们最初的测试运行中，我们证明我们能够使用XUV光子进行成像，空间分辨率优于100 nm，并且我们还可以以几微米的空间分辨率进行APRES。我们还对二维扭曲材料进行了研究，初步结果表明我们可以对莫尔结构中不同的铁电畴进行成像和分辨。