DEVELOPMENTS OF PHOTORESPONSIBLE MATERIALS AND THEIR APPLICATIONS

感光材料的进展及其应用

• 批准号: 09554036
• 负责人: MIZUNO Kazuhiko
• 金额: $ 7.81万
• 依托单位: OSAKA PREFECTURE UNIVERSITY
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for Scientific Research (B)
• 财政年份: 1997
• 资助国家: 日本
• 起止时间: 1997 至 1999
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-09554036/
• 关键词: Organosilicon Compound; Group 14 Organometallic Compound; Photoresponsible Polymer Compound; Photoresponsible Material; π,π-Interaction; Spirocompound; Aromatic Hydrocarbon; Patterning; 14族元素; π-π相互作用; ポリ(4-トリメチルシリルメチルスチレン); カルボキシル基生成; 光環化付加反応

Syntheses and photophysical and photochemical properties of trimethylsilyl-substituted aromatic hydrocarbons, spirocompounds having group 14 element as a spiroelement, and polystyrene derivatives having group 14 organometallic substituents have been examined for the purpose of the development of the photoresponsible materials and photoresponsible polymer compounds having group 14 elements and the following results were obtained. 1) The fluorescence quantum yields of trimethylsilyl-substituted aromatic hydrocarbons such as pyrene, anthracene, and phenanthrene were much higher than those of the corresponding unsubstituted aromatic hydrocarbons.2) 2,2'-Silaspirobiindan and its related compounds having group 14 elements were synthesized and characterized. The absorption and fluorescence spectra of the spirocompounds did not show any π,π-interaction between two aryl groups.3) KrF laser irradiation of thin film of poly (4-trimethylsilylmethylstyrene) under atmospheric condition induced oxygenation at the film surface and crosslinking inside the film. Since the crosslinking was an apparent two photon reaction and required the closely formed radicals, the efficiency of C-Si bond cleavage and the following radical formation at the 4-position of the benzene ring played the crucial role in the crosslinking ability.4) KrF laser irradiation of thin film of poly (4-trimethylstannylmethylstyrene) followed by heating at 500℃ under aerobic condition afforded the thin film pattern of SnOィイD22ィエD2.

为了开发具有第14族元素的光响应性材料和光响应性聚合物化合物，已经研究了三甲基甲硅烷基取代的芳烃、具有第14族元素作为螺元素的螺环化合物和具有第14族有机金属取代基的聚苯乙烯衍生物的合成和化学物理和光化学性质，并获得了以下结果。1)三甲基硅基取代芳烃（如芘、蒽和菲）的荧光量子产率远高于相应的未取代芳烃。2）合成并表征了2，2 '-硅螺二茚及其相关的14族元素化合物。螺环化合物的吸收光谱和荧光光谱表明，两个芳基之间没有任何π、π相互作用。3）大气条件下，KrF激光照射聚（4-三甲基硅基甲基苯乙烯）薄膜，引起膜表面氧化和膜内部交联。由于交联是一个明显的双光子反应，需要紧密形成的自由基，C-Si键的断裂效率和随后在苯环4-位上自由基的形成对交联能力起着关键作用（4-三甲基甲锡基甲基苯乙烯），然后在有氧条件下于500℃加热，得到SnO纳米D22纳米D2薄膜图案。

项目成果

Nobuyuki Ichinose: "Non-linear Laser Intensity Dependence of the Formation of Carboxylic Acid Groups at the Surface of Polymer Films : The Effect of Coupling of Radical Intermediates."Langmuir. 13. 2603-2605 (1997)

Nobuyuki Ichinose：“聚合物薄膜表面羧酸基团形成的非线性激光强度依赖性：自由基中间体偶联的影响。”Langmuir。

Akira Sugimoto: "Hydrobromic Acid-Dimethyl Sulfoxide Reagent for Dealkylation of 5,10-Dialkyl-5,10-dihydrophenazines : Synthesis of 10-Alkyl-2(10H)-phenazines."J.Heterocyclic Chem.. 36. 1057-1064 (1999)

Akira Sugimoto：“用于 5,10-二烷基-5,10-二氢吩嗪脱烷基化的氢溴酸-二甲基亚砜试剂：10-烷基-2(10H)-吩嗪的合成。”J.Heterocycl Chem.. 36. 1057-1064

Kazuhiko Mizuno: "Kokagaku No Kiso To Sentankenkyu"Gakkai Schuppan Center. 95-101 (1998)

水野和彦：《Kokagaku No Kiso To Sentankenkyu》Gakkai Schuppan Center。

Kazuhiko Muzuno: "Advances in Electron Transfer Chemistry VI"JAI Press. 131-165 (1999)

Kazuhiko Muzuno：“电子转移化学进展 VI”JAI 出版社。

Akira Sugimoto: "Hydrobromic Acid-Dimethyl Sulfoxide eagent for Dealkylation of 5,10-Dialkyl-5,10-dihydrophenazines: Synthesis of 10-Alkyl-2(10H)-phenazines"J. Heterocyclic Chem.. 36. 1057-1064 (1999)

Akira Sugimoto：“用于 5,10-二烷基-5,10-二氢吩嗪脱烷基化的氢溴酸-二甲基亚砜试剂：10-烷基-2(10H)-吩嗪的合成”J。