Multiferroic Skyrmion Materials for Next Generation Nanoelectronics

用于下一代纳米电子学的多铁斯格明子材料

• 批准号: DP210102554
• 负责人: Prof Jan Seidel
• 金额: $ 16.82万
• 依托单位: The University of New South Wales
• 依托单位国家: 澳大利亚
• 项目类别: Discovery Projects
• 财政年份: 2021
• 资助国家: 澳大利亚
• 起止时间: 2021-01-01 至 2023-12-31
• 项目状态: 已结题
• 来源: https://dataportal.arc.gov.au/RGS/Web/Grants/DP210102554
• 关键词: Multiferroic; Skyrmion; Materials; Next; Generation

Topological structures, such as domain walls, vortices and skyrmions have recently seen considerable attention due to their potential application in nanoelectronics and new electronic device concepts. These structures are key to the design and understanding of novel functionalities in ferroic materials. The aim of the project is the investigation of fundamental properties of multiferroic skyrmion materials, i.e. their nanoscale structure, surface topology, dynamics and their interaction with external stimuli. The control of these structures through external electric and magnetic fields, as well as strain and light will be investigated for applications in nanoelectronics and data storage.

由于其在纳米电子学和新的电子器件概念中的潜在应用，诸如磁区壁、涡旋和天空微子等拓扑结构最近引起了人们的极大关注。这些结构是设计和理解铁性材料中新功能的关键。该项目的目的是研究多铁性Skyrmion材料的基本性质，即它们的纳米结构、表面拓扑、动力学以及它们与外部刺激的相互作用。通过外部电场和磁场以及应变和光对这些结构的控制将被研究在纳米电子学和数据存储中的应用。