Engineered topological nanostructures – a new frontier in materials design

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The aim of engineering and utilising topological defects such as domain walls and and skyrmions in functional materials is currently receiving tremendous attention. Their significance lies in a plethora of fascinating phenomena for fundamental research and future technological applications in nanoelectronics. One frontier area of research is negative capacitance nanoelectronics using such materials, carrying the prospect of revolutionizing ultralow energy electronics, which will be developed here. The project's expected outcomes are new concepts for the synthesis and design of topological nanostructures for such applications. The utilization of these materials will benefit efficient controllable functionality for future nanoelectronics.