Low-cost Spatial Beam Combination enabling UV Laser Diode Arrays for Stereolithography
Low-cost Spatial Beam Combination enabling UV Laser Diode Arrays for Stereolithography
批准号:
132202
负责人:
金额:
$13.33万
依托单位国家:
英国
项目类别:
Feasibility Studies
财政年份:
2016
资助国家:
英国
项目状态:
已结题
起止时间:
2016 至 --
中文摘要
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英文摘要
Additive layer manufacturing (ALM) has revolutionised the near-net-shape fabrication of precision componentsand advanced cellular and microlattice materials in industries such as aerospace, automotive & medicaldevices. The laser is the primary component and expense in ALM machines but despite high costs (>£25k), thecost and performance of current laser sources particularly for stereolithography result in manufacturingcosts only supporting prototyping. Applied Materials Technology and Euriscus Ltd seek to address thisrequirement through a novel enabling laser technology for stereolithography with a radical improvements tothe cost, power density, compactness, stability, switching speed, reliability, longevity, tuneability, compactnessand electrical efficiency. The step change in the expense, functionality, performance and size of lasers forstereolithography will significantly improve laser scanning speeds, improve part quality and bring opportunitiesto introduce high speed raster scanning systems to promote ALM as an industrial production technology fornovel components and advanced materials.
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依托单位: