A new generation of photoresists for three- dimensional laser lithography

用于三维激光光刻的新一代光刻胶

• 批准号: DP180100316
• 负责人: Prof Christopher Barner-Kowollik
• 金额: $ 29.84万
• 依托单位: Queensland University of Technology
• 依托单位国家: 澳大利亚
• 项目类别: Discovery Projects
• 财政年份: 2018
• 资助国家: 澳大利亚
• 起止时间: 2018-02-21 至 2021-08-20
• 项目状态: 已结题
• 来源: https://dataportal.arc.gov.au/RGS/Web/Grants/DP180100316
• 关键词: new; generation; photoresists; three; dimensional

This project aims at a step-change in photoresist technology by introducing visible-light-induced photochemistry as the basis of next generation direct laser writing (DLW) technology. This willenable functional photoresists that allow precision coding of complex soft matter material properties on the three-dimensional nanoscale. The outcomes of the project will enable the mild fabrication of three-dimensional structures with unique property control and resolution, benefitting diverse fields ranging from designer (stem) cell niches and lab-on-a-chip applications to photonic wire bonding.

该项目旨在通过引入可见光诱导的光化学作为下一代直接激光写入（DLW）技术的基础，实现光刻胶技术的飞跃。这将使功能性光致抗蚀剂能够在三维纳米尺度上精确编码复杂的软物质材料特性。该项目的成果将使三维结构的温和制造具有独特的性能控制和分辨率，从设计（干）细胞壁龛和芯片实验室应用到光子引线键合等各个领域受益。