A new generation of photoresists for three- dimensional laser lithography

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This project aims at a step-change in photoresist technology by introducing visible-light-induced photochemistry as the basis of next generation direct laser writing (DLW) technology. This willenable functional photoresists that allow precision coding of complex soft matter material properties on the three-dimensional nanoscale. The outcomes of the project will enable the mild fabrication of three-dimensional structures with unique property control and resolution, benefitting diverse fields ranging from designer (stem) cell niches and lab-on-a-chip applications to photonic wire bonding.