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Manufacturability versus Unmanufacturability

Manufacturability versus Unmanufacturability
可制造性与不可制造性
批准号:
EP/J01088X/1
负责人:
Michael Kelly
金额:
$26.93万
依托单位:
依托单位国家:
英国
项目类别:
Research Grant
财政年份:
2012
资助国家:
英国
项目状态:
已结题
起止时间:
2012 至 --

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中文摘要
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英文摘要
It is proposed to expand on initial results [1] and to develop a set of rules or guidelines that define the boundary between what is actually manufactureable at the nanoscale on the basis of the various techniques used in the fabrication process and what is intrinsically unmanufactureable. Manufacture requires high yield to tight tolerance to a pre-ordained specification, and little of the current nanoscience literature addresses the issue of manufacturability. It is the absence of such rules or guidelines that prevent nanotechnology journals to distinguish clearly between nanoscience and nanotechnology. The application of the rules will be time-dependent, in that as new methods of fabrication are developed, or current methods of fabrication evolve: some of the rules, however, such as the one referred to1 are inviolable. The rules will focus on the point at which intrinsic feature-to-feature variability kills off any chance of meeting current standards in manufacturing such as six-sigma yield, or perhaps even four-sigma yield of fault-tolerant architectures. Although this look like a negative project at first sight, the aim is entirely positive, to delineate those areas where researchers and developers of new device ideas can be confident of achieving a manufactureable process.[1] M J Kelly,' Intrinsic top-down unmanufacturability', Nanotechnology 22 234303 (2011)
期刊论文(7)
专著(0)
科研奖励(0)
会议论文
DOI: 10.1088/0268-1242/27/8/085007
发表时间: 2012-08-01
期刊: SEMICONDUCTOR SCIENCE AND TECHNOLOGY
影响因子: 1.9
作者: [Dasmahapatra, P., Sexton, J., Kelly, M. J.]
通讯作者: Kelly, M. J.
Achieving reproducibility needed for manufacturing semiconductor tunnel devices
实现制造半导体隧道器件所需的可重复性
DOI: 10.1049/el.2013.0782
发表时间: 2013
期刊: Electronics Letters
影响因子: 1.1
作者: [Shao C]
通讯作者: Shao C
A specific nanomanufacturing challenge.
特定的纳米制造挑战。
DOI: 10.1088/0957-4484/27/11/112501
发表时间: 2016
期刊: Nanotechnology
影响因子: 3.5
作者: [Kelly MJ]
通讯作者: Kelly MJ
DOI: 10.1088/0268-1242/28/12/122001
发表时间: 2013-12
期刊: Semiconductor Science and Technology
影响因子: 1.9
作者: [M. J. Kelly]
通讯作者: M. J. Kelly
7
    Funding to support Operations and Maintenance of the Monterey Accelerated Research System (MARS)
    Versatile Quantum Multiplexing
    • 批准号:
      EP/M009505/1
    • 项目类别:
      Research Grant
    • 资助金额:
      $94.98万
    • 财政年份:
      2015
    • 负责人:
      Michael Kelly
    • 依托单位:
    Quantum Multiplexer
    • 批准号:
      EP/I014268/1
    • 项目类别:
      Research Grant
    • 资助金额:
      $66.37万
    • 财政年份:
      2011
    • 负责人:
      Michael Kelly
    • 依托单位:
    Silicon Resonant Tunnelling Diodes and Circuits
    • 批准号:
      EP/G039089/1
    • 项目类别:
      Research Grant
    • 资助金额:
      $15.09万
    • 财政年份:
      2009
    • 负责人:
      Michael Kelly
    • 依托单位:
    国内基金
    海外基金
    Jagged2high CD11bhigh 调节性树突状细胞防治cGVHD的实验研究
    • 批准号:
      30972790
    • 项目类别:
      面上项目
    • 资助金额:
      28.0万元
    • 批准年份:
      2009
    • 负责人:
      杜欣
    • 依托单位:
    MSC介导的抑止性T细胞级联在allo-BMT后GVHD中的作用与机制研究
    • 批准号:
      30801051
    • 项目类别:
      青年科学基金项目
    • 资助金额:
      19.0万元
    • 批准年份:
      2008
    • 负责人:
      赵智刚
    • 依托单位: