Nanoscale device engineering and plasmon-enhanced light-matter interactions for optically accessible resistive switches
Nanoscale device engineering and plasmon-enhanced light-matter interactions for optically accessible resistive switches
批准号:
2274778
负责人:
金额:
$0.0万
依托单位:
依托单位国家:
英国
项目类别:
Studentship
财政年份:
2019
资助国家:
英国
项目状态:
已结题
起止时间:
2019 至 --
中文摘要
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英文摘要
The project intends to reveal the exact switching mechanism in the RRAMs of various architectures. Using the process recently achieved by the Di Martino Lab [8], we develop innovative fast ways to study real-time movement of individual atoms in the filament formation process. Understanding the nanoscale kinetics of the switching mechanisms should reveal means for the controlled and effective device optimization. An ultimate goal of the project is to develop a RRAM device with high endurance and low programming energy. This would allow for the practical applications of memristive computing, opening up new routes to sustainable future IT. The project involves a combination of physical experiments, equipment modification, optical and electrical characterization, numerical simulation, and analytical description. Memristive devices are tested optically while being slowly switched from OFF to the ON state (and back). The optical response provides data for the modelling of the exact atom movement.So far, the nanoscale kinetics of RRAMs has been explicitly modelled based on the dark field spectroscopy data [8]. In this project we would like to extend the methodology to Raman spectroscopy. So far, we are involved in testing of the RRAMs based on NiO, hBN, and HfO2 which are provided by the Department of Engineering and Material Science of the Cambridge University. In the future, we plan to be pursue various new materials with the potential to become effective memristive switches.
期刊论文(2)
专著(0)
科研奖励(0)
会议论文
Fully Optical in Operando Investigation of Ambient Condition Electrical Switching in MoS2 Nanodevices.
MoS2 纳米器件中环境条件电气开关的全光学操作研究。
DOI:
10.1002/adma.202209968
发表时间:
2023
期刊:
Advanced materials (Deerfield Beach, Fla.)
影响因子:
--
作者:
[Symonowicz J]
通讯作者:
Symonowicz J
海外基金