Use of Zintl Ions in Lithography

Zintl 离子在光刻中的应用

• 批准号: 2657891
• 金额: --
• 依托单位: University of Manchester
• 依托单位国家: 英国
• 项目类别: Studentship
• 财政年份: 2021
• 资助国家: 英国
• 起止时间: 2021 至 无数据
• 项目状态: 未结题
• 来源: https://gtr.ukri.org/projects?ref=studentship-2657891
• 关键词: Use; Zintl; Ions; Lithography

The project will look at main group clusters (Zintl ions) which are covalently bound groups of group 15 elements (typically P, or As, or Bi) which could be used to direct write semiconductor nanostructures using e-beam lithography.The project involves synthesis and characterization of new compounds, typically with the Zintl ion bound to solubilizing organic groups or bound to further metalloids, e.g. indium(III). The compounds are then used to form films on semiconductor surfaces, typically silicon. They are then written with electron beams within a scanning electron microscope. The aim is to make nanostructures of compound semiconductors such as indium phosphide directly.The research falls with EPSRC's remit for advanced materials.

该项目将着眼于主族簇（Zintl离子），它是第15族元素（通常是P、As或Bi）的共价键合基团，可用于使用电子束光刻直接写入半导体纳米结构。该项目涉及新化合物的合成和表征，通常Zintl离子与增溶有机基团或进一步的准金属结合，例如铟（III）。然后，这些化合物用于在半导体表面（通常是硅）上形成薄膜。然后在扫描电子显微镜内用电子束写入它们。其目标是直接制造化合物半导体的纳米结构，如磷化铟。这项研究福尔斯EPSRC先进材料的职权范围。