Use of Zintl Ions in Lithography

该项目将着眼于主要基团簇（Zintl离子），这是15族元素（通常是P，或As，或Bi）的共价结合基团，可用于使用电子束光刻直接写入半导体纳米结构。该项目涉及新化合物的合成和表征，通常与锌离子结合到可溶解的有机基团或结合到进一步的类金属，如铟（III）。然后，这些化合物被用来在半导体表面（通常是硅）形成薄膜。然后在扫描电子显微镜下用电子束书写它们。其目的是直接制造化合物半导体（如磷化铟）的纳米结构。这项研究属于EPSRC对先进材料的研究范围。

The project will look at main group clusters (Zintl ions) which are covalently bound groups of group 15 elements (typically P, or As, or Bi) which could be used to direct write semiconductor nanostructures using e-beam lithography.The project involves synthesis and characterization of new compounds, typically with the Zintl ion bound to solubilizing organic groups or bound to further metalloids, e.g. indium(III). The compounds are then used to form films on semiconductor surfaces, typically silicon. They are then written with electron beams within a scanning electron microscope. The aim is to make nanostructures of compound semiconductors such as indium phosphide directly.The research falls with EPSRC's remit for advanced materials.