Beyond direct-write: Dynamically reconfigurable holographic multibeam interference lithography for high-throughput nanomanufacturing

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This project aims to develop a laboratory implementation of a new dynamic lithography technique, named "holographic multibeam interference lithography (HMBIL)." This new technique will combine the advantages of interference lithography (e.g. [1]) with holographically pre-shaped beams [2]. Unlike traditional interference lithography - which is limited to periodic patterns - HMBIL is anticipated to enable the patterning of arbitrarily-shaped features. The proposed technique will also achieve comparable write-speeds to interference lithography, with our target to write >25 cm2 device area in under 1 hour with resolution down to 100 nm. Achieving arbitrarily shaped nanoscale features with such fast write-speeds is unachievable with current direct-write technologies (e.g. laser direct-write), and presents a key unmet need in the manufacture of emerging electronic and photonic systems. This PhD project aims to address this need by developing HMBIL. As a proof-of-principle, the project will demonstrate the capability of HMBIL for manufacturing an example device structure: multispectral filter arrays. These filter arrays, when integrated with an image sensor, will allow the acquisition of light spectra for applications as diverse as medical imaging to remote sensing. HMBIL manufacture of multispectral filter arrays will open up a range of avenues for custom detectors and imaging sensors for security, industrial or medical applications.