Beyond direct-write: Dynamically reconfigurable holographic multibeam interference lithography for high-throughput nanomanufacturing

该项目旨在开发一种新的动态光刻技术的实验室实现，称为“全息多光束干涉光刻(HMBIL)”。这项新技术将结合干涉光刻的优点(例如[1])和全息预形光束[2]。与仅限于周期性图案的传统干涉光刻不同，HMBIL有望实现任意形状特征的图案化。建议的技术还将达到与干涉光刻相当的写入速度，我们的目标是在不到1小时的时间内写入&gt；25 cm2器件面积，分辨率降至100 nm。用当前的直写技术(如激光直写)无法实现具有如此快的写入速度的任意形状的纳米级特征，并且在新兴电子和光子系统的制造中提出了一个关键的未得到满足的需求。该博士项目旨在通过开发HMBIL来满足这一需求。作为原理证明，该项目将展示HMBIL制造多光谱滤光片阵列器件结构的能力。当这些滤光片阵列与图像传感器集成时，将允许获取从医学成像到遥感的各种应用的光谱。HMBIL制造多光谱滤光片阵列将为安全、工业或医疗应用的定制探测器和成像传感器开辟一系列途径。

This project aims to develop a laboratory implementation of a new dynamic lithography technique, named "holographic multibeam interference lithography (HMBIL)." This new technique will combine the advantages of interference lithography (e.g. [1]) with holographically pre-shaped beams [2]. Unlike traditional interference lithography - which is limited to periodic patterns - HMBIL is anticipated to enable the patterning of arbitrarily-shaped features. The proposed technique will also achieve comparable write-speeds to interference lithography, with our target to write >25 cm2 device area in under 1 hour with resolution down to 100 nm. Achieving arbitrarily shaped nanoscale features with such fast write-speeds is unachievable with current direct-write technologies (e.g. laser direct-write), and presents a key unmet need in the manufacture of emerging electronic and photonic systems. This PhD project aims to address this need by developing HMBIL. As a proof-of-principle, the project will demonstrate the capability of HMBIL for manufacturing an example device structure: multispectral filter arrays. These filter arrays, when integrated with an image sensor, will allow the acquisition of light spectra for applications as diverse as medical imaging to remote sensing. HMBIL manufacture of multispectral filter arrays will open up a range of avenues for custom detectors and imaging sensors for security, industrial or medical applications.