Molecular inking and printing on silicon

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This Strategic Project is directed toward the development of a method for the controlled imprinting of stable molecular-scale patterns on silicon surfaces. The method is embodied in four international patents (three issued, one pending) awarded to this laboratory. At this ultimate nano-scale of miniaturization neither masks nor manual manipulation are practical, instead, the 'ink' that embodies the pattern must be self-assembled. Accordingly, part I of this project seeks novel means for the patterned self-assembly of physisorbed (i.e., loosely attached) inks on silicon. Part II addresses the subsequent problem of permanently attaching these mobile molecular-scale patterns or their reaction-products to the underlying surface by means of 'localized' chemical reactions, induced by heat, light or electrons. Parts I and II taken together constitute a novel 'printing press' for nano-patterning, a fundamental step toward the realization and manufacture of nano-circuitry.