Development of Cathodic Arc Plasma Immersion Ion Implantation (PIII) for biomaterials applications

开发用于生物材料应用的阴极电弧等离子体浸没离子注入 (PIII)

• 批准号: ARC : DP0210853
• 负责人: David McKenzie
• 金额: $ 47.7万
• 依托单位: The University of Sydney
• 依托单位国家: 澳大利亚
• 项目类别: Discovery Projects
• 财政年份: 2002
• 资助国家: 澳大利亚
• 起止时间: 2002-01-01 至 2005-12-31
• 项目状态: 已结题
• 来源: https://researchdata.edu.au/development-cathodic-arc-biomaterials-applications/63062
• 关键词: Development; Cathodic; Arc; Plasma; Immersion

Development of Cathodic Arc Plasma Immersion Ion Implantation (PIII) for biomaterials applications. Medical prostheses have intricate geometries, consisting of shapes such as screws, holes, wedges, cones and textured surfaces. Plasma Immersion Ion Implantation using metal or carbon ions produced by a cathodic arc has been found to be an excellent process for producing surface modification with the properties required in medical applications, such as low stress and excellent adhesion of very thick coatings. To date this process has only been applied to simple, flat substrates. Extending it to shapes of interest for biomaterials applications will require comprehensive understanding and control of the sheath dynamics, which our combined theoretical and experimental approach will provide.

阴极弧等离子体浸没离子注入（PIII）在生物材料应用中的发展。医疗假体具有复杂的几何形状，包括诸如螺钉、孔、楔形物、锥体和纹理表面的形状。使用由阴极电弧产生的金属或碳离子的等离子体浸没离子注入已被发现是用于产生具有医学应用中所需的性质（例如低应力和非常厚的涂层的优异粘附性）的表面改性的优异工艺。迄今为止，该工艺仅应用于简单的平坦基板。将其扩展到感兴趣的形状的生物材料应用将需要全面的理解和控制的鞘动力学，我们的理论和实验相结合的方法将提供。