Algorithmically Designed Optoelectronic Devices

本文描述的程序探索了用于光电子器件的纳米光子结构的算法设计、实验制造和特性。该计划的长期目标是利用这些过程来创造3D结构化设备，包括光子虹吸管、光谱分类器和混合天线，这将使量子计算、太阳能转换和机器视觉领域取得革命性的进步。*该计划的主要目标有三个：*1算法设计*在纳米尺度上，光既表现为粒子又表现为波，这使得具有亚波长特征的结构的设计变得复杂，以至于甚至无法直观地确定纳米光子组件的功能。算法设计解决了这一问题，允许全波光学模拟来决定纳米光子物体的几何形状。我们之前演示了使用进化算法来设计~2.5维介质结构。这些设计技术现在将得到更大的发展，结合人工神经网络、基于自动微分的模拟和逆向设计，将允许更快和更大自由度的结构设计。这使我们可以扩展到全3D设计，甚至多材料系统，从而不仅在性能上实现进一步的改进，而且还引入了一系列前所未有的光学和电子功能。2 3D制造*认识到光电子器件中有限的3D结构，我们的第二个目标是创造方法来制造我们的算法设计的复杂的多材料系统。我们之前已经展示了利用3D多光子光刻技术来制造具有亚波长特征的纳米光子结构的能力。随着对新技术的探索，这一技术将继续开发；我们目前正在合作引入3D打印，使用电子束诱导沉积，以实现数十纳米的特征分辨率。目前正在探索玻璃材料的这一点，但也将扩展到金属。此外，我们正在合作利用复杂3D几何结构的自组装，以允许在大型衬底上并行沉积结构，甚至沉积半导体材料。*2高分辨率的纳米光子表征*对于开发新器件，特别是那些具有新特性的器件，是必不可少的。在此之前，我们应用了超分辨率局域显微镜技术来探测简单纳米线结构周围的光子环境。这将进一步发展，以了解在该计划中创建的更复杂的设备的性能。此外，集成的现场制造和测量系统将允许在自动化系统中开发新的结构，为第一个目标的算法设计过程提供物理辅助。

The program described herein explores the algorithmic design, experimental fabrication, and characterisation of nanophotonic structures for optoelectronic devices. The long term objective is to utilise these processes to create 3D structured devices, including photonic siphons, spectral sorters, and hybrid antennas, which would allow revolutionary advances for the fields of quantum computing, solar energy conversion, and machine vision.***The major objectives of this program are threefold:******1Algorithmic design***At the nanoscale, light behaves both as a particle and a wave, complicating the design of structures with sub-wavelength features, to the point where even the function of a nanophotonic component cannot be determined intuitively. Algorithmic design addresses this, allowing full-wave optical simulations to dictate the geometry of the nanophotonic object. We previously demonstrated the use of an evolutionary algorithm to design ~2.5D dielectric structures. These design techniques will now be taken much furtherincorporation of artificial neural networks, automatic differentiation-based simulations, and inverse design, will allow structures to be designed faster and with larger degrees of freedom. This allows us to expand into fully 3D designs, and even multi-material systems, thereby not only achieving further improvements in performance, but also introducing a wide range of unprecedented optical and electronic functionalities.******2Fabrication in 3D***Cognisant of the limited 3D structure in optoelectronic devices, our second objective is the creation of ways to fabricate the complex multi-material systems our algorithms design. We have previously demonstrated the ability to utilise 3D multi-photon lithography techniques to produce nanophotonic structures with sub-wavelength features. This will continue to be developed, along with exploration into new techniques as well; we are currently collaborating to introduce 3D printing using electron beam-induced deposition for feature resolutions of tens of nanometers. This is currently being explored for glassy materials, but will be expanded to metals as well. Furthermore, we are collaborating to utilise self-assembly of complex 3D geometries to allow parallel deposition of structures over a large substrate, and even deposition of semiconductor materials.******2Nanophotonic characterisation***Characterisation at high resolution is essential to the development of new devices, particularly those with novel properties. Previously we applied a super-resolution localisation microscopy technique to probe the photonic environment around simple nanowire structures. This will be further developed to understand the performance of the much more complex devices created in this program. Furthermore, an integrated in situ fabrication and measurement system will allow for development of novel structures in an automated system, providing a physical accompaniment to the algorithmic design process of the first objective.