激光惯性约束核聚变（ICF）在能源、军事等国家战略上意义重大，目前紫外355nm反射膜的损伤阈值太低成为阻碍ICF发展的关键问题。常规镀膜方式在缺陷控制和电场调控上比较局限，发展新的先进镀膜技术有望取得突破性进展。原子层沉积（ALD）技术对薄膜组分、结构和厚度具有原子层级可控的优点，易于获得高质量薄膜。本项目提出利用ALD制备紫外反射膜的思路，选择阈值较高的Al2O3、HfO2和SiO2为镀膜材料，并提出“以HfO2/SiO2叠层作为底层实现高反射率，Al2O3/SiO2叠层作为顶层实现高损伤阈值”的新结构，通过研究ALD生长叠层膜的工艺参数，以期制备高质量的Al2O3/HfO2/SiO2双叠层紫外反射膜。同时将研究薄膜的损伤特性、损伤机理和电场调控方法，希望结合ALD工艺优化和电场调控大幅度提高Al2O3/HfO2/SiO2反射膜的损伤阈值。为ICF反射膜激光损伤能力的提升做出贡献。

Inertial confinement fusion (ICF) plays a very important role in national strategy like energy and military, but the laser-induced damage threshold (LIDT) of ultraviolet (355 nm) high reflective coating is so low that it has become a core problem to prevent ICF from moving forward. As the conventional film deposition techniques have limitation on the control of defects and electric field (E-field), the development of new advanced coating technology is expected to achieve a breakthrough. Atomic layer deposition (ALD) is able to achieve high controllability over the coating parameters (thickness, composition, structure). So this project attempt to fabricate ultraviolet high reflective coatings through ALD by taking Al2O3、HfO2 and SiO2 as the coating materials. A new structure is proposed here to use HfO2/SiO2 as the bottom stack and Al2O3/SiO2 as the top stack to realize both high reflectivity and high LIDT. The damage properties、damage mechanism and the effect of E-field on the laser-induced damage will be studied in depth. On this basis, we hope to improve the LIDT of the Al2O3/HfO2/SiO2 coating to a great extent by combining the optimization of ALD process and controlling the E-field of the film. This research will make a contribution to the improvement of laser damage properties of reflectors in ICF.