基于超薄（<15 nm）掺杂金属的超宽频带透明电磁屏蔽方法与器件研究

具有宽频带抑制的强电磁屏蔽可满足未来飞行器光窗雷达隐身和先进光学仪器与电子设备电磁屏蔽的国家重大需求，也是光学透明元器件电磁屏蔽的难点。为此，提出一种基于超薄掺杂金属的新型透明电磁屏蔽方法与器件。该方法拟利用共沉积方式在超薄（<15 nm）厚度条件下得到表面连续、粗糙度极低的高质量掺杂金属膜，并基于此超薄掺杂金属与介质构建三类屏蔽器件：1）介质-超薄掺杂金属-介质结构；2）双层纳米光学谐振腔；3）多层一维光子晶体，为实现超宽频带（>50 GHz）电磁屏蔽提供一种解决方案，克服现有透明电磁屏蔽技术中高透光和宽频带强电磁屏蔽无法有效兼顾的难题。对以上基于超薄掺杂金属/介质的功能器件进行光学和微波射频传输建模与特性分析，研究其宽频段内电磁屏蔽的物理机制。此类器件不仅可以广泛应用在航空航天装备中，而且在液晶显示、触控屏等透明导电薄膜技术领域具有广阔的市场空间。

Strong electromagnetic shielding with broadband suppression can meet the new major national needs for future aircraft window radar stealth and advanced optical instruments and electronic equipment electromagnetic shielding, which is also the difficulty of electromagnetic shielding for optical transparent components. For this purpose, a new transparent electromagnetic shielding method and device based on ultra-thin doped metal is proposed. This method intends to use a co-deposition method to obtain the high-quality doped metal film with continuous surface and extremely low roughness under ultra-thin thickness conditions (<15 nm). Based on this ultra-thin doped metal and dielectric, three kinds of shielding devices are constructed: 1) dielectric / ultra-thin doped metal / dielectric structure; 2) double-layer nano-optical resonant cavity; 3) multilayer one-dimensional photonic crystals, which can provide a solution for realizing the ultra wide-band (>50 GHz) electromagnetic shielding, and it can overcome the problem that high light transmission and strong electromagnetic shielding cannot be effectively taken into account. Optical and microwave RF transmission model and analysis for the above-mentioned ultra-thin doped metal / dielectric-based functional devices are established, and the physical mechanism of electromagnetic shielding in the wide frequency band is explored. Such devices can not only be widely used in aerospace equipment, but also have a broad market space in the field of transparent conductive films such as liquid crystal displays and touch screens.