半导体产业的发展需要光刻技术不断地提高光刻分辨率。作为光刻技术32nm技术节点主流解决方案的双重图形技术是一类通过倍频光刻图形空间频率来提高光刻分辨率的技术。现有的具体实现方法普遍存在可实施性不强的问题。基于此，本项目提出采用两步法技术,利用记录介质中Talbot效应和双重曝光叠加,必要时结合网格设计方案实现光刻图形空间频率倍频的新方法。该方法采用浸没式干涉光刻系统对正性光致抗蚀剂进行第一次曝光,显影后获得高分辨率的基频光刻图形；采用波长小于基频光刻图形节距与记录介质折射率乘积的单色平行光垂直入射进行第二次曝光，显影后可实现基频光刻图形空间频率的二倍频、三倍频或更高倍频，能够满足32nm及以下技术节点的要求。该方法具有以下优点：工艺相对简单，与原有的干涉光刻技术兼容性良好，容易实现；记录介质同时起到Talbot效应浸没式光刻技术中高折射率浸没液体的作用，因而能够有效地实现高分辨率倍频。

The development of semiconductor industry greatly depends on the development of photolithography technology, requiring photolithography technology improve lithographic resolution continually. As the mainstream solution for 32nm lithography node, double patterning technology is a type of technology, which enhances lithographic resolution through spatial frequency doubling of lithography pattern. A variety of methods have been proposed to double the spatial frequency of lithography pattern. However, these methods cannot be used conveniently. The method of spatial frequency doubling of lithography pattern based on Talbot effect in recording media and double exposure superposition is proposed in the project，which uses two-step technique and is combined with gridded design scheme if necessary. In the method, high-resolution lithography pattern with fundamental spatial frequency is fabricated after the first exposure and development with immersion interference lithography and positive photoresist. A monochromatic parallel light in vertical incidence with the wavelength less than the product of the pitch of lithography pattern and the refractive index of recording media is used in the second exposure. Lithography pattern with double spatial frequency can be obtained after the second development. Lithography pattern with double, triple or higher spatial frequency can be obtained with this method, which can meet the demand of 32nm and sub-32nm lithography node. The method does not require any special auxiliary devices, and only needs an additional exposure with single beam and an additional development. Therefore, the method has the advantages of having relatively simple process, having good compatibility with the original interference lithography technology, and being easy to be implemented. Additionally, the recording media also acts as the high-index immersion fluid in Talbot effect immersion lithography, therefore high-resolution spatial frequency doubling can be realized.