本项目提出一种研制大面积超高透射率减色滤波器的新方法。运用物理光学理论，在微纳米尺度揭示颜色滤波与材料微结构之间的内在联系；建立基于光与超薄金属表面微纳结构阵列相互作用产生等离激元效应的超透射减色滤波的物理模型，设计不同材料超薄膜厚系列、亚波长尺寸的微纳结构阵列；利用磁控溅射技术和上海光源同步辐射软X射线干涉光刻技术制备大面积（平方毫米级）、具有超高透射率（70%以上）的多种颜色滤波器；建立光机电算一体化的检测系统，尝试利用本项目研发的颜色滤波器在色彩合成图像显示、图像传感器、数码摄像机、投影仪等领域中的实际应用。本项目研制的滤波器具有透射率高、结构简单、可大面积批量制备、易于集成以及在高温、高湿度和长期光照下拥有更大可靠性等优点。

A novel approach to manufacture plasmonic subtractive color filters with large area and ultra high transmission is proposed. Based on the counter-intuitive extraordinary transmission phenomenon in a single ultrathin metal film patterned with periodic subwavelength microstructures, the relationship of the microstructure and the color filtering will be studied systematically together with theoretical modeling. A serial of color filters with different parameters, such as material, film thickness, size, shape and arrangement of the microstructure, will be designed and fabricated using a direct-current magnetron sputtering system and the technique of Soft X-ray Interference Lithography（XIL）at beamline BL14B1 of the Shanghai Synchrotron Radiation Facility (SSRF). The key features of these color filters, which contain only a single ultrathin nanopatterned metal layer, are their simple design, low-cost fabrication and device integration, high transmission (> 70%), large area (>1 mm2) , and greater reliability under high temperature, humidity and long-term radiation exposure conditions.