卡什米尔力的测量、近距离牛顿反平方定律的实验检验、引力波探测和弱信号检测等都需要深入研究检验质量物体的扰动力来源。对于近距离高精度实验和空间引力实验研究而言，检验质量和框架表面的电势沿着空间的变化，即Patch效应是其主要噪声来源之一。因此，Patch效应研究具有重要的科学意义和应用背景。项目组在已发展成熟的扫描力显微镜（SPM）技术基础上发展kelvin探针技术，利用微悬臂上粘贴直径为20μm金属小球作为探针、微位移台改变探针在导体表面的位置、光纤干涉仪探测探针在静电力的梯度下位移变化，实现对导体表面大面积的二维空间电势扫描。根据扫描结果，有目的地在电势高的表面局部吸附中性原子，由于吸附原子中的电子向金属基底迁移，导致表面电偶极化，引起局部电势降低，达到减小金属表面整体Patch势的目的。实验预期测量空间分辨率达到20μm，扫描面积5×5mm^2，电势测量分辨率达到0.1mV。

Electric field noise from patch potentials is a significant noise source for a broad range of precision experiments, including casimir force detection, testing gravitational inverse square law at short ranges, space-based gravitational wave detecting and measurement of weak forces. Hence, it is very significative for well knowing science and technology to investigate patch effects. We will develop a kelvin probe force microscopy at the base of the existing scan probe microscopy technique(SPM). That includes a 20μm-diameter metallic probe ，a micro-moving stage for changing metallic surface positions，a fiber interferometer for monitoring probe oscillations under the static force gradient. We will sacn the patch potentials on a large metallic surface at two dimensions, and according to the measurement ，the metallic surface will is purposefully adsorbed neutral atoms at the high static potential, then patch effects will are reduced because the surface appears electric dipoles induced by electrons transfer at a particle-support interface. This experiment is supposed to achieve 20μm spatial sensitivity in 5×5mm^2 and 0.1mV static potential sensitivity.