针对连续高速面约束光固化成型中界面粘附引起的工艺可靠性制约打印速度提高以及实现大批量生产成本瓶颈问题，提出一种以低成本实现阻聚层并通过调控固液界面浸润特性减小流动粘附阻力的新方法。通过研究纳米结构特征影响打印材料-基底界面接触浸润特性从而影响流动阻力的机理，为表面微观结构的设计提供理论依据；研究以多介质和复杂界面为特征的约束基底光/气混合传输路径影响阻聚气体传质及光能量传输从而影响阻聚层形成的机理，提出实现阻聚层稳定性对基底微观结构和孔隙特征的要求；研究柔性膜表面规定尺寸纳米结构大面积可控制备工艺，为工程化应用奠定基础。项目重点揭示纳米结构及孔隙特征与界面浸润滑移及阻聚层特性的相关性，提出满足减阻及阻聚层形成的微观结构特征设计准则及实现稳定阻聚区的调控方法。本项目的研究，将解决成型效率与工艺可靠性之间相互制约的难题，从而促进光固化成型的应用由产品原型快速制造向功能零件大规模直接制造的转变。

In view of production rate limitation caused by the technics reliability due to adhesion at the fluid-solid interface and the restriction in mass manufacturing due to high cost in continuous fast constrained-surface projection based stereolithography process, a novel method is proposed, in which, polymerization inhibition zone (PIZ) is implemented at low cost and the liquid material flow drag is reduced through modulating the substrate surface wettability resulting in slip at the interface between liquid material and substrate. The mechanism of the influence of surface nanostructures on the contacting state and the flow drag at the interface is investigated, which results in the theory foundation for surface nanostructures planning. The influence law of the composite path for light/gas transmission of the constrained substrate with mutimedia and complex interface on mass transfer of the polymerization inhibition gas and light energy transportation is investigated and then mechanism of the influence of composite path for light/gas transmission on the PIZ formation is revealed, based on which, the requirements on the geometry characteristics of nanostructure and pore on the substrate is proposed. The controllable mass fabrication technics for nanostructures on soft thin film surface with prescribed geometrical size and morphology is investigated and the foundation for engineering application will be built. The nanostructure geometry and pore morphology effects on the interface slip and PIZ property is highlighted, based on which, the design rules of the morphology in micro-scale meeting the requirements for drag reduction and PIZ formation are proposed and the regulation method for forming stable PIZ is presented. Implementation of this project will resolve the problem of the production rate restriction due to technics reliability caused by interface adhesion and hence promote the application of stereolithography advancing forward to mass manufacturing of functional parts from rapid prototyping.