基于光学干涉游标测距的不透明薄膜三维立体形貌测量方法研究

在核聚变、新能源、半导体、光电子等领域中，自支撑（或不透明）薄膜的厚度和形貌是影响关键材料与器件性能的核心参数之一。但由于缺乏面向材料和器件结构的双面同时测量方法，特别是不透明薄膜的三维形貌双向测量精度还无法达到十纳米，已经严重制约了上述领域含膜器件的性能提升和研发进程。.本项目拟开展基于光学干涉游标测距的不透明薄膜三维立体形貌测量方法研究，提出融合调频干涉测量与调相干涉测量并优化其衔接精度，探明光程差与测量精度的关系，采用正弦调制并面向薄膜测量的需求对调制参数与解调方法进行优化，实现大范围、高精度薄膜测量；通过研发易于调节与对准的薄膜三维立体形貌双向测量新型光路结构，将光学干涉游标测距方法应用于非透明薄膜测量，分析并抑制薄膜测量误差，提升不透明薄膜的三维形貌双向测量精度至十纳米以内。.本项目将为不透明薄膜三维形貌光学测量精度的提升以及高性能薄膜元件的研发奠定测试手段和方法的基础。

In the fields of nuclear fusion, new energy, semiconductors, optoelectronics, etc., the thickness and profile of self-supporting (or opaque) films are among the core parameters that affect the performance of key materials and devices. However, due to the lack of simultaneous double-side measurement method for the materials and device structures, noting that the bidirectional measurement accuracy for the three-dimensional profile measurement of opaque film cannot reach ten nanometers yet, the performance improvement as well as the research and development process of film-containing devices in the above fields have been severely restricted..This project intends to carry out research on the measurement method of three-dimensional profile of opaque film based on optical interferometric vernier ranging, to propose to integrate frequency-modulated interferometry and phase-modulated interferometry and to optimize the connection accuracy between them, to study and establish the relationship between optical path difference and measurement accuracy, to adopt sinusoidal modulation and to optimize the modulation parameters as well as demodulation methods according to the needs of thin film measurement, so as to achieve large-scale and high-precision thin film measurement; by developing a novel optical path structure for bidirectional measurement of three-dimensional profile of thin film, which can be easily adjusted and aligned, this project intends to realize optical interferometric vernier ranging for opaque film measurement, and to analyze and suppress the measurement error of thin film measurement, so that the bidirectional measurement accuracy for the three-dimensional profile measurement of opaque film can be improved to ten nanometers or better..This project will lay the foundation of measurement means and methods for the improvement of optical measurement accuracy concerning three-dimensional profile of opaque films, as well as the research and development of high-performance film components.