应用于AMOLED像素驱动电路中的多晶硅薄膜晶体管的退化机理研究
批准号:
61704109
项目类别:
青年科学基金项目
资助金额:
22.0 万元
负责人:
张猛
依托单位:
学科分类:
F0404.半导体电子器件与集成
结题年份:
2020
批准年份:
2017
项目状态:
已结题
项目参与者:
李贵君、吕子玉、陈晓丽、马林发、黎创
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中文摘要
有源矩阵有机发光二极管显示(AMOLED)已经成为下一代显示的核心技术。超高清和片上系统将是下一代平板显示的主流趋势。多晶硅技术可为实现上述要求提供解决方案。虽然对多晶硅薄晶体管(TFT)的可靠性进行了广泛的研究,但其相关应力条件与TFT在像素驱动电路中的实际工作状态仍有区别。本项目将系统研究多晶硅TFT在AMOLED像素驱动电路工作中的退化机理。首先通过分析AMOLED像素驱动电路中的器件工作状态,提取相应的应力模拟条件;然后系统地研究对应应力条件下的多晶硅TFT的退化行为;结合相关的静态瞬态模拟,澄清退化机理并建立物理退化模型;最后通过改善制程工艺和改造器件结构来抑制相关的退化。本项目的开展与实施将对应用于AMOLED像素驱动电路中的多晶硅TFT的寿命预测提供更为精确的理论模型,将对AMOLED像素驱动电路设计提供直接有效的参考,并将进一步加深和延展对多晶TFT可靠性的认知。
英文摘要
Active matrix organic light-emitting diode (AMOLED) display has become the key technology for the next-generation display. Ultra-high resolution and system on panel are the tendency of the next-generation flat-panel display. To fulfill the above requirements, polycrystalline silicon (poly-Si) technology, which has always been a hot research hotspot from academia to industry, become a top contender. The reliability of poly-Si thin film transistors (TFTs) has been extensively investigated for several years. However, the stress conditions depicted in those research works are far from the practical operation conditions in the pixel driver circuits. In this project, the degradation mechanisms of poly-Si TFTs in pixel driver circuits of AMOLED display will be systematically investigated. First, the working conditions of different poly-Si TFTs in pixel driver circuits of AMOLED display will be analyzed and the various simulated stress conditions, which are based on the real working conditions, will be proposed. Then, the degradation behaviors of poly-Si TFTs under different practical stresses will be fully studied. At the same time, the static/transition simulations for different stress conditions using commercial software will be performed. Next, based on degradation behaviors and simulations, the degradation mechanism will be elucidated and the physical degradation model will be developed. At last, from the degradation mechanisms, several methods, such as improved fabrication process and modified device structures, will be proposed to suppress such pixel-stress-induced degradation. The implementation and outcome of this project will offer a more precise model for prediction of pixel device life time in AMOLED displays, will provide direct and significant reference for pixel circuit designers, and will give a deeper insight into the reliability of poly-Si TFTs.
多晶硅技术是实现高清有源矩阵有机发光二极管 (AMOLED: Active-Matrix Organic Light-Emitting Diode) 显示的核心技术之一。AMOLED像素驱动电路中的多晶硅薄晶体管 (TFT: Thin Film Transistor) 的可靠性尤为重要,其好坏关系着AMOLED显示的显示质量和使用寿命。本项目系统研究了多晶硅TFT在AMOLED像素驱动电路工作中的退化行为和退化机理。首次提出“驱动”电压应力、关态电压应力、正向同步电压应力和反向同步电压应力来模拟AMOLED像素驱动电路中驱动TFT和开关TFT的实际工作状态。分别系统研究了多晶硅TFT在“驱动”电压力、关态电压应力、正向同步电压应力和反向同步电压应力的器件退化行为。研究结果发现在“驱动”电压应力下,器件退化只和应力脉冲的上升沿有关;在关态应力下,器件退化只和应力脉冲的下降沿有关;在正向同步电压应力下,器件退化不仅和应力脉冲频率有关而且和应力脉冲上升沿下降沿都有关;在反向同步电压应力下,器件退化最为严重,300秒的应力就可以引发器件几乎100%的开态电流退化,器件退化只和脉冲上升沿有关。通过数据比对,动态热载流子效应主导了上述四种应力条件下的器件退化。结合相关的瞬态模拟,我们提出和完善了非平衡态PN结退化模型来解释上述四种应力条件下的器件退化机理。从退化模型得到启发,通过对多晶硅TFT有源区进行搭桥晶粒 (BG: Bridged Grain)掺杂,可以有效抑制漏端电场,从而大幅度改良多晶硅TFT在上述四种应力条件下的器件可靠性。此外,我们进一步BG TFT进行优化,发明无源漏掺杂的BG多晶硅TFT。对项目的研究结果为多晶硅TFT在AMOLED像素驱动电路中的寿命预测提供更为精确的理论模型;为AMOLED像素电路设计者提供直接有效的参考;丰富了对多晶硅TFT物理退化机制的认知。
期刊论文列表
专著列表
科研奖励列表
会议论文列表
专利列表
OFF-State-Stress-Induced Ins ability in Switching Polycrystalline Silicon Thin-Film Transistors and Its Improvement by a Bridged-Grain Structure
多晶硅薄膜晶体管的断态应力诱导绝缘能力及其通过桥接晶粒结构的改进
DOI:10.1109/led.2018.2872350
发表时间:2018
期刊:IEEE Electron Device Letters
影响因子:4.9
作者:Meng Zhang;Yan Yan;Guijun Li;Sunbin Deng;Wei Zhou;Rongsheng Chen;Man Wong;Hoi-Sing Kwok
通讯作者:Hoi-Sing Kwok
Reversely-Synchronized-Stress-Induced Degradation in Polycrystalline Silicon Thin-Film Transistors and Its Suppression by a Bridged-Grain Structure
多晶硅薄膜晶体管中的反向同步应力引起的退化及其通过桥接晶粒结构的抑制
DOI:10.1109/led.2020.3005046
发表时间:2020
期刊:IEEE Electron Device Letters
影响因子:4.9
作者:M. Zhang;S. Deng;W. Zhou;Y. Yan;M. Wong;H. Kwok
通讯作者:H. Kwok
High-Performance Polycrystalline Silicon Thin-Film Transistors without Source/Drain Doping by Utilizing Anisotropic Conductivity of Bridged-Grain Lines
利用桥晶线各向异性电导率实现无源漏掺杂的高性能多晶硅薄膜晶体管
DOI:10.1002/aelm.201900961
发表时间:2020
期刊:Advanced Electronic Materials
影响因子:6.2
作者:Meng Zhang;Haotao Lin;Sunbin Deng;Rongsheng Chen;Guijun Li;Su-Ting Han;Ye Zhou;Yan Yan;Wei Zhou;Man Wong;Hoi-Sing Kwok
通讯作者:Hoi-Sing Kwok
Degradation Induced by Forward Synchronized Stress in Poly-Si TFTs and Its Reduction by a Bridged-Grain Structure
多晶硅 TFT 中正向同步应力引起的退化及其通过桥接晶粒结构的减少
DOI:10.1109/led.2019.2931007
发表时间:2019-07
期刊:IEEE Electron Device Letters
影响因子:4.9
作者:Meng Zhang;Xiaotong Ma;Sunbin Deng;Wei Zhou;Yan Yan;Man Wong;Hoi-Sing Kwok
通讯作者:Hoi-Sing Kwok
Vertical TO/SiOX/a-Si:H Photodiode-Gated Low-Temperature Polycrystalline Silicon Thin-Film Transistor Intended for In-Display Fingerprint Imaging Applications
适用于显示屏指纹成像应用的垂直 TO/SiOX/a-Si:H 光电二极管门控低温多晶硅薄膜晶体管
DOI:10.1109/led.2018.2853142
发表时间:2018
期刊:IEEE Electron Device Letters
影响因子:4.9
作者:Xi;a Zhou;Meng Zhang;Yitong Xu;Kai Wang;Man Wong;Hoi-Sing Kwok
通讯作者:Hoi-Sing Kwok
面向超清显示和SoP应用的多晶硅薄膜晶体管可靠性研究
- 批准号:--
- 项目类别:面上项目
- 资助金额:59万元
- 批准年份:2022
- 负责人:张猛
- 依托单位:
面向下一代平板显示系统的高性能小晶粒多晶硅薄膜晶体管研究
- 批准号:--
- 项目类别:省市级项目
- 资助金额:10.0万元
- 批准年份:2021
- 负责人:张猛
- 依托单位:
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