室温溅射氧化铝薄膜沉积过程中的晶化诱导与形核调控

Compared with amorphous alumina film, crystalline alumina has better mechanical properties and wide band optical transmission performance. It can be better used as the high speed cutting tool coating and infrared window transparent protective film. The alumina film prepared by magnetron sputtering is usually assumed to be amorphous. However, for the crystalline film preparation, the deposition temperature is high; the process is difficult to control and so on. Therefore, it is urgent to solve two key problems to obtain the crystalline alumina film at room temperature. The first is the initial nucleation control, inhibiting the amorphous trend. The second is the growth process control, inducing crystallization behavior. A plasma emission spectrum feedback control method is proposed in this application, eliminating the hysteresis effect of target poisoning in the process of preparation. And the combination reaction is transferred from the target surface to the substrate. Supplemented by the high power impulse magnetron sputtering technology, the film-forming particle composition and energy will be tried to design and control. The physical and chemical interaction and the kinetic behavior in growth process of alumina thin film will be revealed. Further, the key influencing factors of the initial nucleation of the crystalline alumina will be discussed, and the crystallization inducing conditions of alumina films will be obtained. This study will lay a theoretical basis for the design and control of the crystalline alumina film, and provide a scientific evidence for the preparation of crystalline alumina thin films at room temperature.

晶态氧化铝薄膜与非晶态相比，具有更加优良的力学性能和宽波段光学透过性能，可以更好地用于高速切削刀具涂层及红外窗口透明保护膜等。采用磁控溅射方法制得的氧化铝薄膜通常呈非晶态，而晶态薄膜的制备存在沉积温度高，过程难以控制等问题。为此，室温下获得晶态氧化铝薄膜亟需解决两个关键问题，一是薄膜的初期形核控制，抑制非晶态趋势。二是薄膜的生长过程控制，诱导晶态化行为。本申请提出等离子体发射光谱反馈控制方法，消除制备过程中靶中毒引起的迟滞效应，将铝氧化合反应由靶面转移到基底；辅以高能脉冲磁控溅射技术，通过对成膜粒子成分和能量的设计与调控，揭示氧化铝薄膜生长的物理化学交互作用及动力学行为。探讨晶态氧化铝初期形核过程的关键影响因素，获得氧化铝薄膜的晶化诱导条件，奠定晶态氧化铝薄膜成膜粒子设计与调控的理论基础，为实现室温环境制备晶态氧化铝薄膜提供科学依据。

晶态氧化铝薄膜与非晶态相比，具有更加优良的力学性能和宽波段光学透过性能，可以更好地用作高速切削刀具涂层及红外窗口透明保护膜等。本项目旨在解决磁控溅射方法制备晶态氧化铝薄膜中存在的沉积温度高，过程难以控制等问题。首先，基于等离子体发射光谱反馈控制方法，系统性的建立了反应气体流量，成膜粒子含量以及沉积时间三者的关联，揭示出反应溅射典型迟滞效应消失的主要机理；其次，通过分析成膜环境等离子体特性参数的演变规律，获得了氧化铝薄膜生长过程中的动力学行为，阐述了氧化铝薄膜初期形核及晶态化行为的影响本质；最后，辅以高能脉冲磁控溅射技术，探讨了粒子成分和能量对薄膜生长过程的关键性作用，实现了室温条件下晶态氧化铝薄膜的快速制备。在产业化应用方面，通过对新型薄膜体系的进一步优化，设计实施了两种分别以超强耐腐蚀性能和抗高温氧化性能为目标的涂层产品，为促进晶态氧化铝涂层的产业化应用奠定了良好的基础，将带来巨大的经济和社会效益。

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