SiC MOSFET非线性势垒电容感生瞬态电荷调控的动态损耗模型与速评法
批准号:
62004033
项目类别:
青年科学基金项目
资助金额:
24.0 万元
负责人:
李轩
依托单位:
学科分类:
半导体电子器件与集成
结题年份:
2023
批准年份:
2020
项目状态:
已结题
项目参与者:
李轩
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中文摘要
本项目针对高效高功率密度SiC MOSFET电力电子装置进一步降低器件动态损耗的迫切要求,进行三项创新研究:①建立非线性势垒电容感生瞬态电荷调控的动态损耗模型,揭示漏源电容、栅漏电容、负载电流引入的瞬态电荷在开关过程的输运机理以及瞬态电荷在输运路径中隶属于器件非线性电阻产生焦耳热为动态损耗实质。②基于器件损耗-瞬态电荷-频率内在耦合规律,提出多器件损耗快速评估法及其准确性因子,对多个单极输运器件在不同工作频率下均适用。③提出非线性势垒电容感生电荷调控型新结构,通过分裂栅和P+屏蔽层结构调控漏源/栅漏电容感生电荷数量和导通电阻,实现不同工作频率下的最优动态损耗设计。本课题是一项关于SiC单极型器件新模型、新方法和新结构的应用基础研究,为SiC MOSFET降低动态损耗和损耗快速评估提供了新的思路和方法。
英文摘要
In this project, three innovative studies with further reducing the dynamic loss of power devices are conducted to meet the urgent requirements of high-efficiency and high-power-density SiC MOSFET power electronics. ① A dynamic loss model is established under non-linear barrier capacitance induced transient charge control, which reveals the transport mechanism of charge introduced by the drain-source capacitor, gate-drain capacitor, and the load current during switching process. The model is based on the dynamic loss of Joule heat generated by transient charge flow through non-linear resistance of the device in the transport path. ② Based on the device loss-transient charge-frequency intrinsic coupling law, a multi-device loss rapid evaluation methodology and its accuracy factor are proposed, which are applicable to multiple unipolar devices at different operating frequencies. ③ A non-linear barrier capacitance induced charge regulation type SiC MOSFET is proposed. The split gate and P+ shield layer can regulate the drain-source capacitance, gate-drain capacitance induced charge quantity and Ron, to achieve the optimal dynamic loss design and minimum loss at different operating frequencies. This topic is about the application-oriented basic research through the new model, new method, and new structure, and also provides new theoretical guidance to how to reduce dynamic losses and rapid loss evaluation of SiC MOSFETs.
期刊论文列表
专著列表
科研奖励列表
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专利列表
DOI:10.1109/led.2022.3212465
发表时间:2022-12
期刊:IEEE Electron Device Letters
影响因子:4.9
作者:Changwang Wang;Xuan Li;Lingfeng Li;Xiaochuan Deng;Wentong Zhang;Liu Zheng;Yansheng Zou;W. Qian;Zhaoji Li;Bo Zhang
通讯作者:Changwang Wang;Xuan Li;Lingfeng Li;Xiaochuan Deng;Wentong Zhang;Liu Zheng;Yansheng Zou;W. Qian;Zhaoji Li;Bo Zhang
DOI:10.1109/tpel.2021.3056435
发表时间:2021-02
期刊:IEEE Transactions on Power Electronics
影响因子:6.7
作者:Ximing Chen;Xuan Li;Bangbing Shi;Junmiao Xiang;Yuan-Tung Dai;Chenzhan Li;Xiaochuan Deng;H. Luo
通讯作者:Ximing Chen;Xuan Li;Bangbing Shi;Junmiao Xiang;Yuan-Tung Dai;Chenzhan Li;Xiaochuan Deng;H. Luo
DOI:10.1109/led.2023.3281328
发表时间:2023-07
期刊:IEEE Electron Device Letters
影响因子:4.9
作者:Xuan Li;Lingfeng Li;Kunze Xie;Zhengyu Yang;Wenguang Wu;Xiaochuan Deng;Bo Zhang
通讯作者:Xuan Li;Lingfeng Li;Kunze Xie;Zhengyu Yang;Wenguang Wu;Xiaochuan Deng;Bo Zhang
DOI:10.3390/mi15010092
发表时间:2023-12-31
期刊:Micromachines
影响因子:3.4
作者:
通讯作者:
Investigation of Inrush Current Induced Trench Gate Degradation Inside SiC Mosfet by New Fowler–Nordheim Localization Methodology
采用新的 Fowler-Nordheim 定位方法研究 SiC Mosfet 内部浪涌电流引起的沟槽栅极退化
DOI:10.1109/tpel.2023.3348871
发表时间:2024
期刊:IEEE Transactions on Power Electronics
影响因子:6.7
作者:Hanqing Zhao;Xuan Li;Yifan Wu;Rui Yang;Qian Lou;Lingfeng Li;Xiaochuan Deng;Bo Zhang
通讯作者:Bo Zhang
偏振场三维信息解译的奇异性问题研究
- 批准号:--
- 项目类别:--
- 资助金额:30万元
- 批准年份:2022
- 负责人:李轩
- 依托单位:
4H-SiC超结静态特性与鲁棒性基础研究
- 批准号:--
- 项目类别:面上项目
- 资助金额:52万元
- 批准年份:2022
- 负责人:李轩
- 依托单位:
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