用于紫外探测非晶Ga2O3薄膜的可控制备、微观表征及响应机理分析
批准号:
12074263
项目类别:
面上项目
资助金额:
62.0 万元
负责人:
朱德亮
依托单位:
学科分类:
凝聚态物质结构、相变和晶格动力学
结题年份:
2024
批准年份:
2020
项目状态:
已结题
项目参与者:
朱德亮
中文摘要
非晶Ga2O3薄膜中存在较强的结构无序和化学无序,因此表现出不同于β-Ga2O3薄膜的性质。当用于日盲紫外探测时,前者体现出兼具高响应度和快响应恢复速度的优势,同时低温制备有利于其在柔性领域的应用。但相关研究工作刚刚起步,不同生长条件制备的非晶Ga2O3薄膜性质和器件性能差异较大,光响应机理还不清楚。本项目拟利用磁控溅射和PLD方法通过改变生长和退火工艺调控非晶Ga2O3薄膜的性质,结合对薄膜性质和MSM器件性能的分析,对响应机理得出较明确的结论;在物理机理指导下优化薄膜生长和退火工艺,实现非晶Ga2O3薄膜和高性能探测器的可控制备;设计场效应晶体管探测器,结合非晶Ga2O3薄膜材料内增益和晶体管本征增益进一步提高器件性能,提升其对微弱紫外信号的快速探测能力。本项目以非晶Ga2O3薄膜的微观表征为基础,有望弄清其对日盲紫外光的响应机理,为高性能紫外探测材料和器件的获得找到更佳解决方案。
英文摘要
There exist strong structural disorder and chemical disorder in amorphous Ga2O3 thin film, therefore it exhibits different properties from β-Ga2O3 thin film. When it is applied in solar-blind ultraviolet photodetection, the former has the advantage that high responsivity and fast response recovery speed can be coexisted, and low-temperature preparation is beneficial to its application in the flexible electronics. However, related research work has just started, the properties and device performance of amorphous Ga2O3 thin films prepared under different growth conditions are quite different, and the photoresponse mechanism is still unclear. This project intends to use magnetron sputtering and PLD methods to control the properties of amorphous Ga2O3 thin film by changing the growth and annealing process, and get a clear conclusion on the response mechanism by combining the analysis of film properties and MSM device performance. Under the guidance of physical mechanism, the film growth and annealing process will be optimized to achieve the controllable preparation of amorphous Ga2O3 thin film and high-performance photodetector. Besides, the field-effect transistor structured photodetector will be designed to further improve the device performance by combining the internal gain of amorphous Ga2O3 thin film and the intrinsic gain of transistor, and to promote its fast detectability to weak ultraviolet signals. Based on the microscopic characterization of amorphous Ga2O3 thin film, this project is expected to clarify its response mechanism to solar-blind ultraviolet and find a better solution for obtaining high-performance ultraviolet detection material and device.
当用于日盲紫外探测时,非晶Ga2O3薄膜体现出兼具高响应度和快响应恢复速度的优势,同时低温制备有利于其在柔性领域的应用。本项目采用PLD、磁控溅射、溶液法等多种方法制备a-Ga2O3薄膜,通过生长和退火工艺调控薄膜性质,并构筑了MSM、异质结、光电晶体管等多种结构的日盲紫外探测器。结合对薄膜性质的微观表征和器件性能的分析,对器件响应机理得出了较为明确的结论,提升了器件对微弱日盲紫外信号的探测能力。同时,针对基于MgZnO和金刚石的日盲紫外探测器进行了深入研究。.重要结果如下:(1)MSM结构a-Ga2O3日盲紫外探测器中,由于纳米晶/非晶界面处隧穿内增益机制的存在,器件同时具有超高响应(208563.56A/W)、超低暗电流(0.59pA)、对微弱紫外光的超高信噪比(3.40×10^9)、快速响应恢复速度(52.20/123.51μs,1.61/33.07ms)。(2)对AZO/a-Ga2O3异质结日盲紫外探测器,器件具有类齐纳隧穿内增益机制,10V下响应度达67.26A/W,光暗电流比达2.2×10^3;MSM结构对比器件的相应参数分别为50A/W和400。0V下器件光暗电流比为183.3,响应度为2.92×10^-2A/W。(3)p-GaN/a-Ga2O3异质结日盲紫外探测器实现了优异的自供电探测。对254和365nm紫外光的响应度分别为5.65和43.8A/W,光暗电流比分别为2.03×10^2和1.53×10^3,探测率分别为8.46×10^12和6.56×10^13cm•Hz^1/2•W^-1。(4)a-Ga2O3光电晶体管结构日盲紫外探测器中,负向栅压起到抑制暗电流的作用,同时器件综合了材料的内增益和晶体管的本征增益,导致其光电流和响应度较大。器件的暗电流为5.76×10^-9A;内增益高达6.79×10^3,导致响应度达到942A/W。MSM对比器件的暗电流和响应度分别为8.73×10^-6A和22.8A/W。(5)构筑了低工作电压的高性能Au/混相MgZnO/ZnO:Ga/In异质结日盲紫外探测器。器件的自供电响应度达到0.36A/W;由于异质结探测器内的雪崩击穿现象,导致其在5V偏压下的超高深紫外响应(1390.3A/W)。.通过本项目的研究,获得了高性能日盲紫外探测材料和器件,阐明了器件的响应机理,对推进器件的实际应用有重要的参考价值。
低功耗p型SnO薄膜晶体管的制备及电输运研究
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批准号:--
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项目类别:省市级项目
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资助金额:10.0万元
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批准年份:2025
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负责人:朱德亮
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依托单位:
柔性衬底氢掺杂ZnO:Al(AZO)薄膜的类金属导电性质及其应用研究
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批准号:51371120
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项目类别:面上项目
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资助金额:80.0万元
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批准年份:2013
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负责人:朱德亮
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依托单位:
空位或替代引起的电荷轨道序锰氧化物中的相分离和类马氏体相变
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批准号:10604041
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项目类别:青年科学基金项目
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资助金额:25.0万元
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批准年份:2006
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负责人:朱德亮
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依托单位:
国内基金
海外基金