AZO薄膜类金属导电性质的研究是当前电子信息材料、物理与器件领域的前沿课题。但磁控溅射法在低温下制备的薄膜存在电阻偏高和稳定性较差等问题，且关于柔性衬底薄膜的研究相对较少。本项目拟利用磁控溅射技术，在柔性衬底上采用H掺杂的方法来改善AZO导电薄膜的导电性能及其热稳定性。通过对薄膜结构和热稳定性等的表征及对样品电学性能的测试分析，获得样品的微观结构、表面形貌、电子态、杂质分布等方面的信息，探讨不同生长条件和工艺技术下H相关缺陷在薄膜中的存在状态、H缺陷对薄膜电学性质的影响机理、及如何提高薄膜电学性能的长期稳定性。在理论指导的基础上，再通过改变生长条件、退火处理、衬底表面处理等手段，进一步优化工艺，实现低温下柔性衬底上HAZO薄膜的可控生长，获得具有类金属导电性质的薄膜，改善薄膜的热稳定性。最终获得适合生产条件下HAZO薄膜的制备工艺和技术，为实现其在柔性器件方面的应用奠定理论和实验基础。

The study of metallike conductive properties in AZO thin films is a forward project in the areas of electronic information materials, physics and devices. However, there are some problems in the films prepared by magnetron sputtering method at low temperature, i.e. high and unstable resistivity etc. And also there are few reports about the films on flexible substrates. In this project, hydrogen will be doped into AZO films prepared on flexible substrates by magnetron sputtering method in order to improve their conductive properties and thermostability. By the characterization and analyses of structure, thermostability, electrical properties for the samples, the information can be obtained on microstructure, surface morphology, electronic states and dopants distribution in the samples. And it will be also discussed that the existing states of H-related defects in the films under different growing conditions and technical process, the influencing mechanism of H-related defects on the electrical properties, and how to improve long-term stability of the electrical properties in the films. On the basis of theoretical guidance, also by the adjustment of preparing conditions, the annealing treatment, and the surface treatment of substrates, the techniques will be further optimized, the controllable preparation of HAZO films can be realized on flexible substrates at low temperature, thin films with metallike conductive properties can be obtained and their conductive thermostability can be also effectively improved. Finally, the preparation conditions and techniques adapted to industrial production can be achieved, which will lay the theoretical and experimental foundation for the application of HAZO thin films to the area of flexible devices.