High-performance lateral MoS2-MoO3 heterojunction phototransistor enabled by in-situ chemical-oxidation
High-performance lateral MoS2-MoO3 heterojunction phototransistor enabled by in-situ chemical-oxidation
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原位化学氧化实现高性能横向MoS2-MoO3异质结光电晶体管
DOI:
10.1007/s40843-019-1259-6
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发表时间:
2020-03
影响因子:
8.1
通讯作者:
Duan Huigao
中科院分区:
文献类型:
--
作者:
Bi Kaixi;Wan Qiang;Shu Zhiwen;Shao Gonglei;Jin Yuanyuan;Zhu Mengjian;Lin Jun;Liu Huawei;Liu Huaizhi;Chen Yiqin;Liu Song;Duan Huigao
Construction of in-plane pn junction with clear interface by using homogenous materials is an important issue in two-dimensional transistors, which have great potential in the applications of next-generation integrated circuit and optoelectronic devices. Hence, a controlled and facile method to achieve pn interface is desired. Molybdenum sulfide (MoS2) has shown promising potential as an atomic-layer ntype semiconductor in electronics and optoelectronics. Here, we developed a facile and reliable approach to in-situ transform n-type MoS2 into p-type MoO3 to form lateral pn junction via a KI/I2 solution-based chemical oxidization process. The lateral MoS2/MoO3 pn junction exhibits a highly efficient photoresponse and ideal rectifying behavior, with a maximum external quantum efficiency of~ 650%,~ 3.6 mA W− 1 at 0 V, and a light switching ratio of~ 102. The importance of the built-in pn junction with such a high performance is further confirmed by high-resolution photocurrent mapping. Due to the high photoresponse at low source-drain voltage (VDS) and gate voltage (VG), the formed MoS2/MoO3 junction pn diode shows potential applications in low-power operating photodevices and logic circuits. Our findings highlight the prospects of the local transformation of carrier type for high-performance MoS2-based electronics, optoelectronics and CMOS logic circuits.
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影响因子:
6
作者:
L. Gabette;R. Segaud;Sabrina Fadloun;X. Avale;P. Besson
通讯作者:
L. Gabette;R. Segaud;Sabrina Fadloun;X. Avale;P. Besson
DOI:
10.1016/0584-8539(94)00247-9
发表时间:
1995-07-01
影响因子:
4.4
作者:
SEGUIN, L;FIGLARZ, M;LASSEGUES, JC
通讯作者:
LASSEGUES, JC
影响因子:
9.7
作者:
Lim, June Yeong;Kim, Minju;Im, Seongil
通讯作者:
Im, Seongil
影响因子:
56.9
作者:
Britnell, L.;Ribeiro, R. M.;Novoselov, K. S.
通讯作者:
Novoselov, K. S.
影响因子:
10.8
作者:
Yijin Zhang;Jianting Ye;Yohei Yomogida;T. Takenobu;T. Takenobu;Y. Iwasa
通讯作者:
Yijin Zhang;Jianting Ye;Yohei Yomogida;T. Takenobu;T. Takenobu;Y. Iwasa