Alignment of grain boundary in a Si film crystallized by a linearly polarized laser beam on a glass substrate
Alignment of grain boundary in a Si film crystallized by a linearly polarized laser beam on a glass substrate
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玻璃基板上线偏振激光束晶化硅薄膜晶界的排列
DOI：
10.1063/1.1362336
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发表时间：
2001
影响因子：
4
通讯作者：
A. Shimoyama
中科院分区：
文献类型：
--
作者：
S. Horita;Y. Nakata;A. Shimoyama
我们使用线偏振的Nd：YAG脉冲激光束对Pyrex玻璃衬底上沉积的非晶Si薄膜进行了晶化。发现在结晶膜中，晶界以约550 nm的周期或激光束的波长排列。同时，在通过λ/4板的圆偏振光束结晶的Si膜中，随机产生晶界。这意味着激光束的线性偏振对于周期性地对准晶界或在被照射的Si膜中产生周期性的温度分布是必要的。
We performed crystallization of an amorphous Si film deposited on a Pyrex glass substrate using a Nd:YAG pulse-laser beam with linear polarization. It was found that, in the crystallized film, the grain boundaries were aligned with a period of about 550 nm or the wavelength of the laser beam. Meanwhile, in the Si film crystallized by circularly polarized beam that passed through the λ/4 plate, the grain boundaries were randomly generated. This means that linear polarization of the laser beam is essential to align grain boundaries periodically or to produce a periodic temperature distribution in the irradiated Si film.
影响因子：
4.9
作者：
SAMESHIMA, T;USUI, S;SEKIYA, M
通讯作者：
SEKIYA, M