The Production and Characterization of Ytterbium‐Stabilized Zirconia Films for SOFC Applications
The Production and Characterization of Ytterbium‐Stabilized Zirconia Films for SOFC Applications
复制标题
用于 SOFC 应用的镱稳定氧化锆薄膜的生产和表征
DOI：
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发表时间：
2016
期刊：
影响因子：
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通讯作者：
O. Turkoglu
中科院分区：
文献类型：
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作者：
E. Yildiz;S. Yılmaz;O. Turkoglu
在0.02≤x≤0.12的掺杂范围内，研究了（ZrO2） 1-x (Yb2O3)x二元体系。采用Pechini法合成了掺镱氧化锆粉体。x射线衍射（XRD）测试表明，fcc ZrO2在掺杂率为8-12 mol%时稳定。对制备的yb稳定Zr （YbSZ）薄膜进行了表征；它们的厚度和均匀性取决于YbSZ浆料的性质。采用预涂工艺对各涂层参数进行了优化和确定。通过差热分析/热重（DTA/TG）、扫描电镜（SEM）和交流阻抗测量对样品进行了表征。
(ZrO2)1–x(Yb2O3)x binary systems were investigated in the doping range of 0.02 ≤ x ≤ 0.12. Ytterbium-doped zirconia powders were synthesized using the Pechini method. X-ray diffraction (XRD) measurements showed that fcc ZrO2 was stabilized for 8–12 mol% Yb-doping rate. The produced Yb-stabilized Zr (YbSZ) films were characterized; their thickness and homogeneity properties depended on the nature of the YbSZ slurry. All coating parameters were optimized and determined with precoating treatments. The samples were characterized by differential thermal analysis/thermal gravimetry (DTA/TG), scanning electron microscopy (SEM) and ac impedance measurements.
影响因子：
15
作者：
Paul, Sulagna;Chotana, Ghayoor A.;Smith, Milton R., III
通讯作者：
Smith, Milton R., III