Workshop - Application of Plasma and Lasers in Electronics, Chemical, and Material Processing (San Diego State University; February 23-24, 1987)

该项目是一个关于等离子体和激光在 电子材料加工 研讨会将在San 1987年2月23日和24日，迭戈州立大学。 涵盖的主题 涉及干法处理方法，包括：等离子体蚀刻 机理，分子-表面相互作用，分子 光谱学到蚀刻和化学气相沉积的诊断， 以及激光在微电子制造中的应用。 的 研讨会包括一场小组讨论，重点关注关键科学问题 和技术问题，需要进一步广泛的研究和新的 未来材料加工的发展方向。

This project is a workshop on the use of plasmas and lasers in electronic material processing. The workshop is to be held at San Diego State University on February 23 and 24, 1987. The topics covered relate to dry processing methods and include: plasma etching mechanisms, molecule-surface-interactions, application of molecular spectroscopy to diagnostics of etching and chemical vapor deposition, and applications of laser to microelectronics fabrication. The workshop includes a panel discussion focusing on critical scientific and technical issues that need further extensive research and on new methods to be developed for material processing in the future.