课题基金 / 基金详情

Research in Strongly Coupled Plasmas - (Women/Minority Supp)

Research in Strongly Coupled Plasmas - (Women/Minority Supp)
强耦合等离子体研究 - (女性/少数族裔补充)
批准号:
8713337
负责人:
Gabor Kalman
金额:
$18.31万
依托单位:
依托单位国家:
美国
项目类别:
Continuing Grant
财政年份:
1988
资助国家:
美国
项目状态:
已结题
起止时间:
1988-01-01 至 1993-09-30

项目摘要

项目成果

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中文摘要
翻译
这是美国国家科学基金会拨款ECS-8315655A03的续期,代表与佛蒙特州大学的KI.Golden(ECS-8713627)的合作。关于强耦合等离子体的集体模和动态输运系数的理论工作还有待继续进行。由Golden和Kolman发展并已成功应用于各种物理情况的理论方案将被用于具有工程重要性的物理系统的研究。包括金属中的电子气、MOS器件中的二维电子气、异质结构和熔盐。所有这些系统都有一个共同的特点,即粒子之间的库仑相互作用很强,这使得传统的微扰方法的使用变得不够充分。GK格式是为分析这类系统而发展的一种新的非摄动方法。
英文摘要
This is a renewal of NSF grant ECS-8315655A03 and represents collaborative work with K.I. Golden of the University of Vermont (ECS-8713627). Continued theoretical work on collective modes and dynamical transport coefficients of strongly coupled plasmas is to be carried out. The theoretical scheme developed by Golden and Kolman and already successfully applied to various physical situations will be employed to the study of physical systems of engineering importance. These include electron gas in metals, 2-dimensional electron gas in MOS devices, hetero- structures and molten salts. All these systems share the the property that the Couloumb interaction between the particles is strong which renders the use of customary perturbation methods inadequate. The GK scheme is a novel non-perturbative approach developed for the analysis of such systems.
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Dynamical Processes in Strongly Coupled Complex Plasmas
  • 批准号:
    1105005
  • 项目类别:
    Continuing Grant
  • 资助金额:
    $21.0万
  • 财政年份:
    2011
  • 负责人:
    Gabor Kalman
  • 依托单位:
Collaborative Research: Research on Strongly Coupled Plasmas
  • 批准号:
    0813153
  • 项目类别:
    Continuing Grant
  • 资助金额:
    $22.34万
  • 财政年份:
    2008
  • 负责人:
    Gabor Kalman
  • 依托单位:
Dynamical Processes in Strongly Coupled Complex Plasmas
  • 批准号:
    0715227
  • 项目类别:
    Continuing Grant
  • 资助金额:
    $30.0万
  • 财政年份:
    2007
  • 负责人:
    Gabor Kalman
  • 依托单位:
Collaborative Research: Research on Strongly Coupled Plasmas
  • 批准号:
    0514619
  • 项目类别:
    Continuing Grant
  • 资助金额:
    $25.2万
  • 财政年份:
    2005
  • 负责人:
    Gabor Kalman
  • 依托单位:
海外基金