Novel Radiation-Sensitive Materials

本研究的目的是研究由功能化聚合物和无机引发剂组成的辐射敏感材料的化学和物理性能。这些材料中的聚合物组分包含碱敏感或还原氧化位，而引发剂是过渡金属络合物或半导体粒子，在辐射激发下产生碱或还原氧化当量。这些材料将使用吸收和发射光谱、闪速热解、电子自旋共振光谱、热重分析和分子量测量进行表征。最有希望的材料将被评估为用于集成电路微图案化的光致抗蚀剂和/或电子束抗蚀剂。这项研究将由佐治亚大学和IBM Almanden研究实验室合作进行。这些材料将被评估其在电子行业的潜在应用。

The objective of the research is to investigate the chemical and physical properties of radiation-sensitive materials composed of a functionalized polymer and an inorganic initiator. The polymeric component in these materials contains a base-sensitive or reduction-oxidation site, while the initiator is a transition metal complex or semiconductor particle that generates base or reduction-oxidation equivalents upon excitation by the radiation. The materials will be characterized using absorption and emission spectroscopies, flash pyrolysis, electron spin resonance spectroscopy, thermogravimetric analysis, and molecular weight measurements. The most promising materials will be evaluated as photoresist and/or electron-beam resists for micropatterning for integrated circuits. The research will be conducted as a collaboration between the University of Georgia and IBM Almanden Research Laboratory. The materials will be evaluated for their potential applications in the electronics industry.