Bonding, Stability and Structure in Isoelectronic Solids

将研究化学物质的性质和强度， 过渡金属与p区元素的化合物中的键合 重点关注化合物等电子系列的趋势。 的 研究计划包括测量热力学 稳定性和粘合强度，通过质量损失渗出，渗出- 质谱和高温固态电流 细胞，x射线光电子能谱研究的两个核心 能级和价导带区，以及能带结构 KKR和Extended Huckel方法计算。 的目标 是为了加深对固体中键合的理解， 在结合强度和结构方面，获得高质量 热力学稳定性的数据，并开发预测 考虑到现有最佳见解的稳定性 化学键的本质

Studies will be made of the nature and strength of chemical bonding in compounds of transition metals with p-block elements with focus on trends in isoelectronic series of compounds. The research program includes measurement of thermodynamic stabilities, and bond strengths, by mass-loss effusion, effusion- mass spectrometry, and high temperature solid-state galvanic cells, x-ray photoelectron spectroscopic studies of both core levels and valence-conduction band regions, and band structure calculations by both KKR and Extended Huckel methods. The goals are to deepen the understanding of bonding in solids, especially in relation to bond strength and structure, obtain high quality data on thermodynamic stability, and develop ways of predicting stabilities which take into account the best insights available about the nature of chemical bonding.