The Preparation of Superconducting Thin Films by the Decomposition of Metal-Organic Complexes

通过分解挥发性金属有机络合物，可以制备含铜超导氧化物薄膜。对薄膜进行了表征，并与块体材料进行了比较。将尝试在钙钛矿和氧化镁衬底上沉积薄膜，以确定使用这种衬底是否可以获得更高的稳定性。这项研究的第二个目标是利用射频辉光放电进行等离子体辅助金属有机化学气相沉积(MOCVD)。初步研究表明，在350℃的温度下，利用射频辉光放电分解和氧化异丙醇铝可以在硅衬底上制备出高质量的氧化铝薄膜。

Thin films of superconducting oxides containing copper will be prepared by decomposing volatile metalorganic complexes. The films will be characterized and compared with bulk materials. Attempts will be made to deposit the films on perovskite and MgO substrates in order to ascertain if added stability could be obtained by the use of such substrates. A second goal of the research will be directed towards the utilization of an RF glow discharge to perform plasma-assisted metalorganic chemical vapor deposition (MOCVD). Preliminary studies have indicated that high quality aluminum oxide films can be produced on silicon substrates at temperatures of 350 C by the decomposition and oxidation of aluminum isopropoxide using an RF glow discharge.