Engineering Research Equipment Grant: Evaporator for Thin Films of High Tc Superconductors

此设备补助金是为了建立一个设施， 新型氧化物超导体薄膜的合成。两大 薄膜合成中的问题是： 薄膜的化学计量，以及将足够的 氧气 到目前为止，薄膜已经通过使用大的 常规电子束和溅射中的氧背景压力 钱伯斯 所有这些膜都需要高温氧退火， 因此，对于需要以下功能的应用程序， 与其他薄膜器件的兼容性。 这个薄膜设备 设计用于提供大速率的氧气到达 衬底，优选地处于原子状态，同时保持金属 在低压下的源和它们的速率监视器。 这使得 沉积速率更稳定和可重复性，并扩展了 源的寿命。 该设施将用于生产高 在最低的加工温度下生产高质量的薄膜， 可用于隧道，运输测量和设备。

This Equipment Grant is provided to build a facility for the synthesis of thin films of new oxide superconductors. Two major problems in the synthesis of thin films are: the ability to control the stoichiometry of the film, and the ability to incorporate enough oxygen. So far thin films have been synthesized by using a large oxygen background pressure in conventional e-beam and sputtering chambers. All these films require a high temperature oxygen anneal, hence, making them less practical for applications requiring compatibility with other thin film devices. This thin film facility is designed to provide a large rate of oxygen arrival at the substrate, preferably in an atomic state, while maintaining the metal sources and their rate monitors at low pressures. This makes the deposition rates more stable and reproducible, and extends the lifetime of the sources. This facility will be used to produce high quality films at the lowest process temperatures, and the films will be used for tunneling, transport measurements and devices.