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Thin Film Deposition and Etching Facility for Undergraduate Physics Students

Thin Film Deposition and Etching Facility for Undergraduate Physics Students
面向物理本科生的薄膜沉积和蚀刻设备
批准号:
8852985
负责人:
J Clements
金额:
$2.24万
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
1988
资助国家:
美国
项目状态:
已结题
起止时间:
1988-07-15 至 1991-06-30

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中文摘要
翻译
阿巴拉契亚州立大学将购买一个高真空泵站,一个射频/直流溅射系统,以及一个电子束蒸发和蚀刻系统。该设备将用于改进高年级物理实验课程的教学。将介绍真空技术和薄膜性能的实验,并利用该设备制备的微结构将用于光电子学的新实验。高级本科生也将使用该设备进行个人项目。阿巴拉契亚州立大学将提供等额的资金。
英文摘要
Appalachian State University will purchase a high-vacuum pumping station, an RF/DC sputtering system, and an electron beam evaporation and etching system. This equipment will be used to improve instruction in upper-division physics laboratory courses. Experiments in vacuum technology and thin film properties will be introduced, and microstructures fabricated with the equipment will be used in new experiments in opto-electronics. Advanced undergraduate students also will use the equipment for individual projects. Appalachian State University will match the NSF grant with an equal amount of funds.
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