Engineering Research Equipment Grant: Picosecond Excimer Laser Source for Research on VUV/XUV Lasers

这项工程研究设备赠款将提供资金， 创新的高功率皮秒KrF准分子激光系统。 在其 初始阶段，激光器将提供30 ps脉冲，50 mJ 能量为248 nm。 一种新发现的KrF饱和吸收体， 极大地减少了放大的自发辐射问题， 所有短脉冲准分子激光系统，并将允许一个完全 这是构建此类系统的新方法。 激光脉冲 将用于在固体靶上产生等离子体，而软x- 从等离子体发射的射线将激发内壳层电子， 分子蒸汽 该技术用于分子生物学的可行性 在PI的NSF资助计划（ECS-

This Engineering Research Equipment Grant will provide funds for an innovative high power picosecond KrF excimer laser system. In its initial stage, the laser will deliver 30 ps pulses with 50 mJ of energy at 248 nm. A newly discovered saturable absorber for KrF will greatly reduce the amplified spontaneous emission problem pertinent to all short-pulse excimer laser systems and will allow for a completely new approach for the construction of such systems. The laser pulse will be used to produce a plasma on a solid target, and the soft x- rays emitted from the plasma will excite inner-shell electrons of molecular vapors. The feasibility of this technique for molecular species has been shown within the PI's NSF funded program (ECS-