Theoretical & Experimental Investigations of Surface Morphology Induced by Sputter Deposition & Removal of Materials

这笔资金由材料理论、陶瓷和电子材料共同资助，启动了一项研究计划，将主要溅射材料的表面形态的理论和实验研究结合起来。从理论上讲，将对一个体现了溅射一些关键特征的模型进行数值和分析研究。实验上，扫描隧道显微镜将用于研究溅射沉积原位生长的薄膜和溅射刻蚀形成的薄膜的表面结构。

This grant co-funded between Materials Theory, and Ceramics and Electronic Materials initiates a program of research combining theoretical and experimental studies of the surface morphology of primarily sputtered materials. Theoretically, numerical and analytical studies will be undertaken on a model that embodies some of the key features of sputtering. Experimentally, the scanning tunnelling microscope will be used to study the surface structure of films grown in situ by sputter deposition and on surfaces formed by sputter etching.