High Resolution Interferometric Optical Profiler for Submicron Linewidth Measurement

用于进行线宽测量的光学仪器 或用于发现小特征的几何形状受到以下限制 与光的波长相关的分辨率。 基础 光学理论指出，其特征在于， 照明波长是不可分辨。 然而，在这方面， 在图像中存在关于更高空间分辨率的信息。 比光学分辨率给出的频率。 通过利用 反卷积、超分辨率或高分辨率显微镜 技术，关于更高空间频率的信息可以 被提取。 本研究的目的是调查 获得精确亚微米线宽的技术 用于在干涉测量系统中实现的测量 光学轮廓仪，希望能测量 0.1 μ m量级的范围。 一种适用的技术是 可用于商业产品。 可能的应用包括 集成电路或集成光学器件的测量 设备的几何形状以及测量的凹坑在紧凑 磁盘母盘和磁记录头几何形状。

Optical instruments for performing linewidth measurement or for finding the geometry of small features are limited by the resolution associated with the wavelength of light. Basis optical theory states that features small than one-half of the illumination wavelength are unresolvable. However, information is present in the image about higher spatial frequencies than given by the optical resolution. By utilizing deconvolution, superresolution, or high resolution microscopy techniques, information about higher spatial frequencies may be extracted. The aim of this research is to investigate techniques of obtaining accurate submicron linewidth measurement for implementation in an interferometric optical profiler with the hope of measuring features on the order of 0.1 um in extent. An applicable technique would be useful in a commercial product. Possible applications include the measurement of integrated circuit or integrated optical device geometries as well as measurement of pits in compact disk masters, and magnetic recording head geometry.