REG: A Microwave Interferometer for Measuring Electron Concentrations in Plasma Discharges

堪萨斯大学研究中心。 将购买微波干涉测量设备 根据NSF工程研究设备 化学和石油使用补助金 该部门将致力于支持 工程研究。 这些设备将用于 等离子体工艺的几个研究项目 用于半导体工业的包括：（l） 开发了一种新技术， 电子浓度测量使用电- 阻抗分析，（2）开发和测试 等离子体中电子和离子动力学模型 放电;（3）中性化学研究 等离子体反应器中的动力学 的总体目标 研究是能够操作和开发等离子体 更好地满足未来的需求 半导体行业。

The University of Kansas Center for Research, Inc. will purchase microwave interferometry equipment under this NSF Engineering Research Equipment Grant for use in the Chemical and Petroleum Department, which will be dedicated to support research in engineering. The equipment will be used for several research projects on plasma processes used in the semiconductor industry including: (l) development of a novel technique to measure electron concentration measurement using electrical- impedance analysis, (2) development and testing of models of electron and ion kinetics in a plasma discharge, and (3) research on the neutral chemistry kinetics in plasma reactors. The overall goal of the research is to be able to operate and develop plasma processes better for the future needs of the semiconductor industry.