Experimental and Numerical Investigation of Diamond-Like Carbon Film Deposition Processes

本研究探讨了等离子体辅助化学气相沉积类金刚石（DLC）薄膜的基本机理。这项研究将结合最先进的实验技术和详细的数值模拟过程。该研究的成功完成将导致PACVD工艺生产的DLC膜的有效合成和表征的发展。该项目的主要目标是开发一种商业上可行的涂层工艺，用于在各种基材上沉积无应力类金刚石薄膜，具有高工艺可重复性。实验研究将包括反应器中PACVD过程的现场监测和控制。采用先进的现场监测仪器包，测量等离子体的关键物理化学参数以及薄膜的性质、化学计量学和应力。该过程的综合数值模拟将包括反应器中电子动力学的考虑和相互作用，甲烷沉积系统的等离子体化学和影响沉积过程的表面反应。广泛的测量能力将为模型的验证和改进提供充分的数据基础。利用诊断能力和详细的数值模型，将为DLC薄膜沉积的工业反应器开发一套稳健的工艺参数。

Farouk 9310544 The study addresses the fundamental mechanisms affecting the deposition of diamond-like carbon (DLC) films by the plasma assisted chemical vapor (PACVD) process. The study will combine state-of-the-art experimental techniques and detailed numerical modeling of the process. Successful completion of the research will lead to the development of effective synthesis and characterization of DLC films produced by the PACVD process. A primary objective of the project is to develop a commercially viable coating process for depositing stress-free diamond-like thin films with a high process reproducibility on various substrates. Experimental investigations will include in-situ monitoring and control of the PACVD processes in a reactor. An advanced in-situ monitoring instrumentation package will be used to measure the key physico-chemical parameters of the plasma and the properties, stoichiometry and the stress in the film. Comprehensive numerical modeling of the process will include the consideration and interaction of the electron kinetics in the reactor, plasma chemistry of a methane based deposition system and surface reactions that affect the deposition process. The extensive measurement capabilities will provide an adequate data base for the validation and improvement of the model. Using the diagnostic capabilities and the detailed numerical model, a set of robust process parameters will be developed for scaled up industrial reactors for DLC film deposition.