Analysis, Modeling and On-Line Control of Advanced Semiconductor Plasma Etching Reactors

该奖项是为了在半导体电路制造的等离子体蚀刻反应器的化学分析和化学建模方面建立一个全面的研究项目。化学分析和建模将使用非常灵敏的红外二极管激光吸收光谱获得的化学选择性诊断数据进行。建模的目标是建立一个新的、可预测的等离子体蚀刻化学的理解水平。预计这项工作将对半导体电子和制造技术产生直接影响。诊断数据的可用性将有助于改进蚀刻工艺设计和控制所需的预测模型的制定，特别是在亚微米特征的处理中。

Whittaker 9313320 The award is for establishing a comprehensive research program in chemical analysis and chemical modeling of plasma etching reactors for semiconductor circuit manufacturing. The chemical analysis and modeling will be performed using chemically selective diagnostic data obtained by a very sensitive implementation of an infra-red diode laser absorption spectroscopy. The modeling will have the goal of establishing a new and predictive level of understanding of the plasma etch chemistry. The work is expected to have a direct impact on semiconductor electronics and manufacturing technology. The availability of the diagnostic data will help in the formulation of predictive models needed for improved etch process design and control, especially in the processing of submicron features.