Acquisition of Processing Instrumentation for Advanced Materials Research
Acquisition of Processing Instrumentation for Advanced Materials Research
批准号:
9512425
负责人:
Guy Gilliland
金额:
$12.5万
依托单位:
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
1995
资助国家:
美国
项目状态:
已结题
起止时间:
1995-09-01 至 1997-08-31
中文摘要
将在埃默里大学建立一个先进的材料加工设施,以补充物理和化学部门现有的表面、电气和光学表征能力。该加工仪器由电子束蒸发器、光刻掩模对准器和表面轮廓仪组成,将用于加工和制造简单的器件,并表征基于化合物半导体薄膜的小型结构。利用该加工仪器的研究项目包括电场对III-V型化合物半导体中光激发载流子的影响,高速光电探测器的基础研究和制造,利用有机金属外延生长的III-V型宽带隙氮化物薄膜的加工和表征,以及用于湍流热风速测量研究的多点金属薄膜探针的开发。埃默里大学在半导体结构的光学和电学特性方面已经建立了相当大的研究工作。尽管在人力资源和表征设备上进行了投资,但缺乏材料制备和加工能力。该处理仪器将为研究人员提供必要的工具,以开展专注于半导体微结构的物理和化学的有力研究工作。***
英文摘要
9512425 Gilliland An advanced materials processing facility will be established at Emory University which will complement existing surface, electrical, and optical characterization capabilities in the physics and chemistry departments. The processing instrumentation, consisting of an electron beam evaporator, a lithographic mask aligner, and a surface profilometer, will be utilized to process and fabricate simple devices and to characterize small structures based on compound semiconductor thin films. Research programs which will make use of the processing instrumentation include electric field effects on photoexcited carriers in III-V compound semiconductors, fundamental studies as well as fabrication of high speed photodetectors, processing and characterization of wide bandgap III-V nitride films grown by organometallic epitaxy, and development of multiple point metal film probes for thermal anemometry studies of turbulence. %%% Emory has established sizable research efforts focused upon the optical and electrical characterization of semiconductor structures. Despite this investment in human resources and in characterization equipment, a materials preparation and processing capability is lacking. The processing instrumentation will provide the researchers with the necessary tools to conduct a vigorous research effort focused on the physics and chemistry of semiconductor microstructures. ***
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国内基金
海外基金
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依托单位: