Instrumentation to Enable and Enhance Three-Dimensional Nanofabrication Capabilities in the National NanofabricationUsers Network

[9601886 .戴维斯纳米制造，或在纳米尺度上制造固体结构，已经发展成为一个领域，它是世界经济的一个重要部分，即半导体集成电路工业的基础。该领域制造用于光学、物理、材料科学、化学、生物学、医学和力学等其他领域的小型结构的能力和潜力也正在被研究人员和工业界迅速认识到。然而，除了某些材料生长技术之外，纳米制造领域在某种程度上一直局限于由光滑固体表面的平面所定义的两个横向维度。这部分是由于对光学和电子束光刻来说很重要和常见的景深问题，等离子体蚀刻各种各样的材料以形成高纵横比结构的困难，以及在三维空间中表征精细结构的困难，等等。国家纳米制造用户网络（NNUN）是由美国国家科学基金会（nsf）资助的五所大学纳米制造实验室组成的网络，其任务是为美国纳米制造社区（包括工业、学术界和政府实验室）提供用户设施服务，并为同一社区提供解决问题的技术领导。NNUN由五所大学的站点组成，其中两个站点（康奈尔大学和斯坦福大学）作为主要站点，其余三个站点（霍华德大学，宾夕法尼亚州立大学和加州大学圣巴巴拉分校）作为分包商。这五所大学的实验室将硅加工（斯坦福大学）、纳米光刻（康奈尔大学）、宽带隙材料（霍华德大学）、新型材料（宾夕法尼亚州立大学）和III-V加工（UCSB大学）的专业知识结合在一起，所有这些都是纳米制造的共同主题。迄今为止，该网络正在为迅速接近1000个用户的用户群提供服务，通过项目转诊、分享实验室和教学技术和信息以及补充能力来实施和加强服务。该合同将获得化学机械抛光（CMP）系统：该系统将位于康奈尔基地，将允许化学机械蚀刻结构进行平面化，并为NNUN带来CMP能力；反应离子蚀刻添加剂：由于各向异性蚀刻对3D结构纳米制造的重要性，宾夕法尼亚州立大学将为透明氧化物、压电材料和塑料等材料添加RIE。

9601886 Davis Nanofabrication, or the fabrication of solid structures on the nanometer size scale, has evolved into a field which is the foundation of a significant fraction of the world economy, namely, the semiconductor integrated circuit industry. The ability and potential of this field to fabricate small structures for use in other fields such as optics, physics, materials science, chemistry, biology, medicine, and mechanics is also being quickly realized by both researchers and industry. Yet, with the exception of some materials growth techniques, the field of nanofabrication has been somewhat confined to the two lateral dimensions which are defined by the plane of a smooth solid surface. This is partly due to depth-of-field issues which are important and common to optical and electron beam lithography, the difficulty of plasma etching a wide variety of materials to form high aspect ratio structures, and the difficulty of characterizing fine structures in three dimensions, to name a few. The National Nanofabrication Users Network (NNUN), an NSF-sponsored network of five university nanofabrication laboratories, has been tasked with providing user-facility service to the US nanofabrication community (including industry, academia, and government laboratories), and to provide technical leadership to that same community toward the solutions of problems. The NNUN consists of sites at five universities, with two sites (Cornell and Stanford) serving as primaries with the remaining three (Howard, Penn State, and University of California at Santa Barbara) serving as subcontractors. Together, these five University laboratories unite expertise in silicon processing (Stanford), nanometer lithography (Cornell), wide-bandgap materials (Howard), novel materials (Penn State), and III-V processing (UCSB), all within the common theme of nanofabrication. To date, the Network is serving a user base which is rapidly approaching 1000 users, service which is implemented and enhanced by project referral s, sharing of laboratory and teaching techniques and information, and complementary capabilities. This award will find acquisition of a: A Chemical Mechanical Polishing (CMP) System: This system, to be located at the Cornell site, will permit the chemical mechanical etchback of structures for planarization and bring CMP capabilities to the NNUN; Reactive Ion Etching Additions: Due to the importance of anisotropic etching to the nanofabrication of 3D structures, Penn State will add an RIE for materials such as transparent oxides, piezoelectrics, and plastics.