Development of a Chemical Kinetic Mechanism for Modeling Silane Combustion Systems

本文建立了与硅烷燃烧相关的气相化学模型CTS-9618190。产生了描述硅/氢/氧体系的基本化学机理。通过与现有实验数据的比较和实验室合成火焰中二氧化硅(SiO_2)生成的实验研究，验证了模型的正确性。大量的硅烷燃料被用来为制造微芯片和光纤提供二氧化硅。这些应用需要高纯度、低缺陷的材料；满足这些要求需要了解导致二氧化硅形成的详细气相化学知识。

ABSTRACT CTS-9618190 A model of the gas-phase chemistry relevant to silane (SiH4) combustion is developed. An elementary chemical mechanism describing the silicon/hydrogen/oxygen system is generated. The model is verified by comparison with existing experimental data and by an experimental study of silica (SiO2) formation in a laboratory-scale synthesis flame. Large quantities of silane fuels are used to provide silica for the fabrication of microchips and fiber optics. These applications require high-purity, low-defect material; meeting these requirements demands knowledge of the detailed gas-phase chemistry leading to formation of silica.