US-India Cooperative Research: Processing Properties and Characterization of Ferroelectric Films

9712182 Agrawal描述：此奖项支持美国-印度合作研究：铁电薄膜的制程、特性与表征。 合作者是RS Katiyar，波多黎各大学，学士德苏，弗吉尼亚理工学院，和D.C.阿格拉瓦尔，印度理工学院，坎普尔。 研究人员将研究新型光电子和铁电薄膜，旨在提高对合成和加工，材料表征以及薄膜生长和特性建模的理解。 将使用各种技术来探测微米到纳米尺度的组成、结构和表征，以便在这些新颖的纳米材料中建立结构-性质关系。 材料. 铁电薄膜的基础研究在电光器件、微波电子学、微传感器和高密度封装等方面具有巨大的应用潜力。 范围：该项目支持两个美国研究机构与印度理工学院（坎普尔）之间的新合作。 所有设施都配备了最先进的仪器，用于拟议的合成，表征和建模工作。 这项研究有望促进三个卓越中心之间的长期科学和工程联系。 该项目是互利的，符合INT的支持标准。 ***

9712182 Agrawal Description: This award supports the U.S.-India Cooperative Research: Processing, Properties, and Characterization of Ferroelectric Films. The collaborators are R.S. Katiyar, University of Puerto Rico, S.B. Desu, Virginia Polytechnic Institute, and D.C. Agrawal, Indian Institute of Technology, Kanpur. The researchers will study thin films of novel optoelectronics and ferroelectrics with the aim of enhancing understanding of synthesis and processing, materials characterization and modelling of thin film growth and properties. Various techniques will be used to probe the micro-to nano-scale compositions, structure and characterization in order to establish structure-property relationships in these novel materials. Fundamental research on ferroelectric thin films holds great potential for eventual application in electro-optical devices, microwave electronics, micro sensors, and high density packaging. Scope: This project supports a new collaboration between two U.S. research institutions and the Indian Institute of Technology, Kanpur. All facilities are equipped with state-of-the-art instrumentation for the proposed synthesis, characterization and modelling work. The research is expected to stimulate a long-term science and engineering link among three centers-of excellence. The project is mutually beneficial and meets INT criteria for support. ***