Symposium D "Non-Lithographic & Lithographic Methods for Nanofabrication: from ULSI to Photonics to Molecular Electronics"; Boston, MA; November 27-December 1, 2000.

材料研究学会 纳米纤维的非光刻光刻方法：从ULSI到光子学到分子电子学将涉及微纳米结构的材料科学，化学，物理和生物学，包括潜在的应用领域。除了这些纳米级系统的材料科学和物理学之外，研讨会还将讨论诸如自组装和光刻方法等技术，作为构建具有微米和纳米特征尺寸的结构的制造工具，以及依赖于亚微米尺寸结构的新型和新兴器件。%纳米结构材料通常显示出与其相应的块体材料明显不同的化学和物理性质。纳米技术领域，如电子，光子和催化材料的纳米结构，表现出各种应用的新特性，目前被视为行业内的高度优先事项。NSF支持参加本次研讨会的优先权将给予学生，博士后和教师谁是在他们的职业生涯早期谁可能会发现很难前往本次会议。

The Materials Research Society symposium on Non-Lithographic & Lithographic Methods for Nanofabrication: from ULSI to Photonics to Molecular Electronics will address the materials science, chemistry, physics, and biology of micro- and nanoscale structures including potential applications areas. In addition to the materials science and physics of these nanoscale systems, the symposium will include a discussion of techniques such as self-assembly and lithographic methods as fabrication tools for building structures with micron and nanometer feature sizes, and novel and emerging devices that rely on structures with submicron dimensions. %%%Nanostructured materials often display chemical and physical properties distinctly different from their corresponding bulk materials. Nanotechnology areas such as electronic, photonic and catalytic materials nanostructures exhibiting novel properties for various applications are currently viewed as high priorities within industry. Preference for NSF support to participate in this symposium will be given to students, postdocs, and faculty who are early in their careers who may otherwise find it difficult to to travel to this conference.