MRI: Acquisition of a Raith 150 Electron Beam Lithography System for a Nanofabrication Education, Research Training and Exploration Consortium

0216518 Feinerman这笔赠款将允许UIC购买一个高分辨率的电子束光刻设备（Raith 150），保证最低50纳米的图案化能力，并已证明亚10纳米的图案化。UIC将把它设置在一个专门用于光刻的100级洁净室中。选择这种特定机器的原因将在第3c节“研究仪器和需求的描述”中详细说明，并且是图案化性能、计量能力、易于由不同人群使用、购买价格和年度维护成本。这台机器将使UIC联盟的其他6个成员（Notre Dame，NWU，Purdue，UC，IIT和NIU）以及UIC周围的大型企业基地和国家实验室受益。基础科学和工程研究正在进入一个新的时代，纳米材料的基础知识，包括磁性，半导体，超导体，电子器件，生物材料，流体和相关的界面现象将是先进设备和工程系统的设计必不可少的。随着器件缩小到自然长度尺度以下，如最小铁磁畴尺寸（100-1000 nm），超导相干长度（~ 1-100 nm）或生物分子的特征尺寸，将需要大量的基础研究和创新。该设备将使这些程序和许多更多的，不能在这里描述，由于空间的限制：UIC，纳米agentism研究，和nanopatterningNote Dame，纳米电子学和高速电路和器件lIT，纳米电子学NIU，纳米电子学普渡大学，NEMS的直接DNA表征和测序在分子水平NWU，二维光子带隙材料的生物分子 检测 UC，用于细胞粘附和迁移的机械研究的电子控制基板。提到的其他应用是在补充文件部分收到的23封支持信，以支持UIC的电子束光刻开发。这些是来自10家公司和9个非营利机构的兴趣和意向书。该纳米光刻系统将成为伊利诺伊大学芝加哥分校微/纳米纤维应用实验室（MAL）的一部分。MAL已成为芝加哥地区的区域用户设施，在过去的3.5年里，它的用户群增加了7倍，超过50%的用户来自UIC以外。这种快速增长是由于MAL提供了一套多功能的制造和表征设备的开放和廉价的访问，培训和指导。在PI设施中增加电子束光刻将使他们能够大大增加UIC和周边社区在国家纳米计划中的参与。

0216518FeinermanThis grant will allow UIC to purchase a high resolution e-beam lithography equipment (Raith 150) with a minimum of 50nm patterning capability guaranteed and sub-10nm patterning has been demonstrated. UIC will set it up in a class 100 clean room bay devoted exclusively to lithography. The reasons for the selection of this particular machine will be elaborated on in section 3c "Description of Research Instrumentation and Needs," and are the patterning performance, metrology capability, ease of use by a diverse population, purchase price, and annual maintenance cost. This machine will benefit 6 other members of the UIC consortium (Notre Dame, NWU, Purdue, UC, IIT, and NIU) as well as a large corporate base around UIC and a national laboratory. Basic science and engineering research are entering a new era where fundamental knowledge of nanoscale materials including magnetic, semiconductors, superconductors, electronic devices, bio-materials, fluids, and related interface phenomena will be essential for the design of advanced devices and engineered systems. A great deal of basic research and innovation will be needed as devices shrink below the natural length scales like the size of the minimum ferromagnetic domain (100-1000 nm), the superconducting coherence length (~ 1-100 nm), or the characteristic size of bio molecules. The equipment will enable these programs and many more that can not be described here due to space limitations:UIC, Nanomagentism studies, and nanopatterningNote Dame, Nanoelectronics and high-speed circuits and deviceslIT, NanoelectronicsNIU, NanoelectronicsPurdue, NEMS for the Direct DNA Characterization and Sequencing at the Molecular LevelNWU, Two dimensional Photonoic band gap materials for biomolecular detection UC, Electronically controlled substrates for mechanistic studies of cell adhesion and migration.The additional applications mentioned are the 23 letters of support received to support e--beam lithography development at UIC that are in the supplementary documents section. These are letters of interest and intent from 10 companies, and from 9 non-profit institutions. The nano-lithography system will be a part of University of Illinois at Chicago's Micro/Nanofabrication Applications Laboratory (MAL). The MAL has become a regional user facility for the Chicago area and in the last 3.5 years it has increased its user base 7 fold with over 50% of the users coming from outside of UIC. This rapid growth is due to the MAL offering open and inexpensive access, training, and guidance on a versatile set of fabrication and characterization equipment. The addition of e-beam lithography to the PIs facilities will allow them to greatly increase the participation of UIC and the surrounding community in the national nano initiative.