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MRI: Acquisition of a Deep Silicon Etch Tool for NEMS/MEMS Fabrication

MRI: Acquisition of a Deep Silicon Etch Tool for NEMS/MEMS Fabrication
MRI:购买用于 NEMS/MEMS 制造的深硅蚀刻工具
批准号:
0320659
负责人:
Svetlana Tatic-Lucic
金额:
$0.0万
依托单位:
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
2003
资助国家:
美国
项目状态:
已结题
起止时间:
2003-09-01 至 2008-08-31

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中文摘要
翻译
这份MRI提案涉及采购用于标准速率高级硅刻蚀(ASE-SR)的STS多路复用系统。使用该设备常规解决的困难工艺包括:硅的深晶片和穿透晶片蚀刻、高深宽比特征蚀刻、膜释放蚀刻和绝缘体上硅(SOI)应用。在微电子机械系统(MEMS)领域,STS蚀刻机提供了实现不受约束的器件几何形状的独特能力。这极大地增加了设备设计者可用的选项。此外,在MEMS封装活动中(这无疑对MEMS领域的可制造性和未来具有最深远的影响),它提供了更多的机会,如实现高密度通晶片互连,以及大量MEMS封装的新选择。该设备可用于制造用于金属蒸发的极其精密的机械掩模(即荫罩),进而可用于将纳米器件(如碳纳米管)固定在基板上的所需位置。此外,这种设备可以改装成进行常规的反应离子刻蚀(RIE),这对一般微电子领域的研究人员非常有用。正在进行或计划在不久的将来进行的具体项目包括制造用于研究动态加载对骨细胞行为的影响的复杂微执行器,用于向微型燃料电池输送氢气的微型化学合成微型工厂,以及具有高尺寸精度的微纳拉伸测试样品。正在制定本科水平的教育计划,以适应这些领域的研究增长。根据计划,将在MEMS领域开设新的实验室课程(包括电气和计算机工程系,以及新出现的生物工程本科课程,PI和共同PI是其中的参与者),这一设备将是不可或缺的。此外,它还将服务于利哈伊谷周围的社区,特别是当地的大学和K-12年级的学生,通过提供一种工具来制造有趣的微型设备,以进行视觉上有吸引力的演示。一项特别的努力将向所有教育水平的学生介绍微型和纳米技术的神奇世界。
英文摘要
This MRI Proposal involves procurement of an STS Multiplex System for Standard Rate Advanced Silicon Etch (ASE-SR). Difficult processes that are routinely addressed using this equipment include: deep- and through-wafer etching of silicon, high aspect ratio feature etching, membrane release etching, and silicon on insulator (SOI) applications. In the microelectromechanical systems (MEMS) arena, the STS etcher provides the unique capability to achieve unconstrained geometry of the devices. This very significantly increases the options available to the device designer. In addition, in MEMS packaging activities (which have undoubtedly the most profound impact on the manufacturability and the future of the MEMS field in general), it offers additional opportunities such as achieving high-density through-wafer interconnects, as well as a plethora of new options for MEMS encapsulation.This piece of equipment can be used for the fabrication of extremely precise mechanical masks (i.e., shadow masks) for metal evaporation, which in turn can be used to anchor nanodevices such as carbon nanotubes in the desired position on a substrate. Also, this equipment can be modified to do conventional reactive ion etching (RIE), which would be very useful for researchers is the field of general microelectronics.Specific projects under way or planned for the near future include fabrication of sophisticated microactuators used to study effects of dynamic loading on bone cell behavior, miniature chemical synthesis microplants for the delivery of H2 to micro-fuel cells, and micro- and nano-tensile test specimens with high dimensional accuracy.Broader ImpactsAt Lehigh University, there is currently a huge new set of thrusts in the fields of MEMS, bioengineering and nanotechnology. Educational programs at the undergraduate level are being developed to match the research growth in these areas. It is the plan that new laboratory courses will be offered in the MEMS field (both in the Electrical and Computer Engineering Department, as well as the newly emerging Bioengineering undergraduate track in which the PI and co-PI's are participants), for which this piece of equipment would be indispensable. Also, it will serve the surrounding community within the Lehigh Valley, particularly the local colleges and K-12 students by providing a vehicle for the fabrication of interesting microdevices for visually attractive It "show and tell" demonstrations. A special effort will be made to introduce students on all educational levels into the magical worlds of micro- and nanotechnology.
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IPA Assignment
  • 批准号:
    2203264
  • 项目类别:
    Intergovernmental Personnel Award
  • 资助金额:
    $25.75万
  • 财政年份:
    2021
  • 负责人:
    Svetlana Tatic-Lucic
  • 依托单位:
EAGER: Development of a multi-electrode array (MEA) with active recruiting of cells and mechanically confined neuronal networks
  • 批准号:
    1321356
  • 项目类别:
    Standard Grant
  • 资助金额:
    $14.99万
  • 财政年份:
    2013
  • 负责人:
    Svetlana Tatic-Lucic
  • 依托单位:
CAREER: A System for Extracellular Recording from Patterned Neuronal Networks with Sensing Applications
  • 批准号:
    0448886
  • 项目类别:
    Continuing Grant
  • 资助金额:
    $40.0万
  • 财政年份:
    2005
  • 负责人:
    Svetlana Tatic-Lucic
  • 依托单位:
海外基金