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MRI: Track 1 Acquisition of a Deep Reactive Ion Etching System for Enhanced Semiconductor Processing Capability

MRI: Track 1 Acquisition of a Deep Reactive Ion Etching System for Enhanced Semiconductor Processing Capability
MRI:轨道 1 采购深度反应离子蚀刻系统以增强半导体加工能力
批准号:
2320476
负责人:
Bei Fan
金额:
$96.35万
依托单位:
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
2023
资助国家:
美国
项目状态:
未结题
起止时间:
2023-09-01 至 2026-08-31

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中文摘要
翻译
密歇根州立大学(MSU)一直保持着强大的传统和持续的趋势,开展快速增长的尖端多学科研究领域,对《2022年芯片与科学法案》以及关键和新兴技术的成功至关重要,如半导体、微电子、能源、传感器、生物医学技术、量子技术等。该项目旨在要求牛津大学等离子体Pro 100 Estrelas深度反应离子刻蚀(DRIE)系统-瞄准精确、快速、灵活、高纵横比的深硅刻蚀,以创建多样化的微/纳米结构,以加速密歇根州立大学和密歇根中西部的这些尖端研究领域。ESTRELAS DRIE仪器是一种独特的尖端深硅刻蚀系统,可提供卓越的灵活性和生产能力,以快速(刻蚀速率28微米/分钟)和高纵横比(70:1)在半导体上制造各种微/纳米结构。该仪器将安置在电气和计算机工程研究净化室(ERC),这是一个多学科共享研究设施,可供密歇根州立大学和外部用户使用。有了Estrelas DRIE,密歇根州立大学将成为一个地区枢纽,为密歇根州中西部的密歇根州立大学以及其他机构和当地公司的用户提供先进和灵活的半导体加工支持。该仪器将立即使来自密歇根州立大学4个不同系和2个学院以及包括弗劳恩霍夫美国中西部中心、内华达大学拉斯维加斯分校和布法罗大学在内的其他机构的不同研究团队及其跨学科研究项目立即受益。预计相关研究将产生大量专利,并转化为实际应用。除了研究方面的好处,ESTRELAS DRIE还将作为一种教育工具,培训半导体、微/纳米工程、生物技术、能源、物理、环境科学等跨学科的研究人员和工程师。所要求的ESTRAS DRIE将刺激密歇根州立大学快速增长的研究领域的发展,包括半导体、微电子、能源、传感器、生物医学技术、量子技术等。所要求的ESTREAS DRIE的能力将在以下主要领域开辟许多新的研究途径:(1)宽带隙半导体:金刚石半导体纳米膜转移以制造金刚石-GaN功率器件;(2)可再生能源收集和储存:了解下一代高容量电极的机械退化;新型工程表面开发,用于在液体流过表面时增强发电;(3)传感器、MEMS和系统:用于将光束重定向到不同位置的VO2薄膜涂层MEMS分光光度计;低成本和高灵敏度的光纤温度传感器;(4)生物医学技术:用于与大脑和神经系统无缝通信的神经微型植入物;用于评估大量神经元的高带宽硅基神经探头;用于监测个人暴露在空气中的可穿戴式微流控系统;与多功能微型设备集成的智能微型机器人;(5)量子技术:作为量子信息载体的提高光子提取效率的金刚石纳米管;用于量子应用的金刚石薄膜。所要求的ESTRELAS DRIE是一个重要的支持工具,它不仅将满足不同研究人员群体加快其当前/未来研究的迫切需求,而且还将促进系内、密歇根州立大学和该机构以外的工程师和科学家之间的多学科合作。此外,所要求的Estrelas DRIE仪器将扩展密歇根州立大学现有的微/纳米制造能力,并满足广泛的微/纳米尺度科学、工程和技术的需求。通过加速这些最先进的研究领域,该工具还将成为创造科学培训和艺术作品的重要工具,以吸引学生,特别是来自代表不足的群体的学生,从事STEM教育和研究。该奖项反映了NSF的法定使命,并通过使用基金会的智力优势和更广泛的影响审查标准进行评估,被认为值得支持。
英文摘要
AbstractMichigan State University (MSU) has maintained a strong tradition and continuing trend in conducting fast-growing cutting-edge multidisciplinary research areas critical to the success of Chips and Science Act 2022 and Critical and Emerging Technologies, like semiconductors, microelectronics, energy, sensors, biomedical technologies, quantum technologies etc. This project seeks to request an Oxford PlasmaPro 100 Estrelas Deep Reactive Ion Etching (DRIE) system - targeting precision, rapid, flexible, high-aspect-ratio deep silicon etching to create diverse micro/nanostructures to accelerate these cutting-edge research areas at MSU and in Midwest Michigan. The Estrelas DRIE instrument is a unique cutting-edge deep silicon etching system that offers exceptional flexibility and throughput to fabricate various micro/nanostructures on semiconductors with fast speed (etch rate 28 µm/min), and high aspect ratio ( 70:1). The instrument will be housed at the Electrical and Computer Engineering Research Cleanroom (ERC), a multidisciplinary shared research facility available to both MSU and external users. With the Estrelas DRIE, MSU will become a regional hub for providing advanced and flexible semiconductor processing support to users from MSU as well as other institutes and local companies in Midwest Michigan. The instrument will immediately benefit a diverse team of investigators and their cross-disciplinary research projects from 4 different departments and 2 colleges at MSU and other institutions including Fraunhofer USA Center Midwest, University of Nevada Las Vegas, and University of Buffalo. The associated research is expected to produce numerous patents to be translated into practical use. Besides research benefits, the Estrelas DRIE will serve as an educational tool for training interdisciplinary researchers and engineers in semiconductor, micro/nanoengineering, biotechnologies, energy, physics, environmental science, etc. The requested Estrelas DRIE will stimulate the development of MSU’s rapidly growing research areas, including semiconductors, microelectronics, energy, sensors, biomedical technologies, quantum technologies etc. The capabilities of the requested Estrelas DRIE will open many new avenues of research in the following major areas: (1) Wide bandgap semiconductors: diamond semiconductor nanomembrane transfer to create diamond-on-GaN power devices; (2) Renewable energy harvesting and storage: understanding of mechanical degradation of next-generation high-capacity electrodes; novel engineered surface development for enhanced electricity generation when liquid flows over surfaces; (3) Sensors, MEMS and Systems: VO2 thin film coated MEMS spectrophotometer to re-direct a light beam to different places; low-cost and highly sensitive fiber-optic temperature sensors; (4) Biomedical technologies: neural miniaturized implants for seamless communication with the brain and the nervous systems; high-bandwidth silicon-based neuroprobes to assess a large number of neurons; wearable microfluidic systems to monitor personal exposure to airborne; intelligent micro robots integrated with multifunctional microdevices; (5) Quantum technologies: diamond nanopillars to enhance photon extraction efficiencies as the carriers for quantum information; diamond membrane for quantum applications. The requested Estrelas DRIE is an essential enabling tool that will not only address the critical need of a diverse group of researchers to expedite their current/future research, but also promote multidisciplinary collaborations between engineers and scientists within the department, across MSU, and beyond the institution. Additionally, the requested Estrelas DRIE instrument will expand the existing micro/nanomanufacturing capabilities at MSU and serve the needs of broad micro/nanoscale science, engineering, and technology. By accelerating these state-of-the-art research areas, the instrument will also serve as an important tool to create scientific training and artistic works to attract students, especially from the underrepresented groups, to pursue STEM education and research.This award reflects NSF's statutory mission and has been deemed worthy of support through evaluation using the Foundation's intellectual merit and broader impacts review criteria.
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Collaborative Research: Enhanced electricity generation through liquid flow over durable slippery Surfaces
  • 批准号:
    2202688
  • 项目类别:
    Standard Grant
  • 资助金额:
    $26.33万
  • 财政年份:
    2022
  • 负责人:
    Bei Fan
  • 依托单位:
海外基金