MRI: Track 1 Acquisition of a Deep Reactive Ion Etching System for Enhanced Semiconductor Processing Capability

MRI：轨道 1 采购深度反应离子蚀刻系统以增强半导体加工能力

• 批准号: 2320476
• 负责人: Bei Fan
• 金额: $ 96.35万
• 依托单位: Michigan State University
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 2023
• 资助国家: 美国
• 起止时间: 2023-09-01 至 2026-08-31
• 项目状态: 未结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=2320476&HistoricalAwards=false
• 关键词: MRI; Track; Acquisition; Deep; Reactive

AbstractMichigan State University (MSU) has maintained a strong tradition and continuing trend in conducting fast-growing cutting-edge multidisciplinary research areas critical to the success of Chips and Science Act 2022 and Critical and Emerging Technologies, like semiconductors, microelectronics, energy, sensors, biomedical technologies, quantum technologies etc. This project seeks to request an Oxford PlasmaPro 100 Estrelas Deep Reactive Ion Etching (DRIE) system - targeting precision, rapid, flexible, high-aspect-ratio deep silicon etching to create diverse micro/nanostructures to accelerate these cutting-edge research areas at MSU and in Midwest Michigan. The Estrelas DRIE instrument is a unique cutting-edge deep silicon etching system that offers exceptional flexibility and throughput to fabricate various micro/nanostructures on semiconductors with fast speed (etch rate 28 µm/min), and high aspect ratio ( 70:1). The instrument will be housed at the Electrical and Computer Engineering Research Cleanroom (ERC), a multidisciplinary shared research facility available to both MSU and external users. With the Estrelas DRIE, MSU will become a regional hub for providing advanced and flexible semiconductor processing support to users from MSU as well as other institutes and local companies in Midwest Michigan. The instrument will immediately benefit a diverse team of investigators and their cross-disciplinary research projects from 4 different departments and 2 colleges at MSU and other institutions including Fraunhofer USA Center Midwest, University of Nevada Las Vegas, and University of Buffalo. The associated research is expected to produce numerous patents to be translated into practical use. Besides research benefits, the Estrelas DRIE will serve as an educational tool for training interdisciplinary researchers and engineers in semiconductor, micro/nanoengineering, biotechnologies, energy, physics, environmental science, etc. The requested Estrelas DRIE will stimulate the development of MSU’s rapidly growing research areas, including semiconductors, microelectronics, energy, sensors, biomedical technologies, quantum technologies etc. The capabilities of the requested Estrelas DRIE will open many new avenues of research in the following major areas: (1) Wide bandgap semiconductors: diamond semiconductor nanomembrane transfer to create diamond-on-GaN power devices; (2) Renewable energy harvesting and storage: understanding of mechanical degradation of next-generation high-capacity electrodes; novel engineered surface development for enhanced electricity generation when liquid flows over surfaces; (3) Sensors, MEMS and Systems: VO2 thin film coated MEMS spectrophotometer to re-direct a light beam to different places; low-cost and highly sensitive fiber-optic temperature sensors; (4) Biomedical technologies: neural miniaturized implants for seamless communication with the brain and the nervous systems; high-bandwidth silicon-based neuroprobes to assess a large number of neurons; wearable microfluidic systems to monitor personal exposure to airborne; intelligent micro robots integrated with multifunctional microdevices; (5) Quantum technologies: diamond nanopillars to enhance photon extraction efficiencies as the carriers for quantum information; diamond membrane for quantum applications. The requested Estrelas DRIE is an essential enabling tool that will not only address the critical need of a diverse group of researchers to expedite their current/future research, but also promote multidisciplinary collaborations between engineers and scientists within the department, across MSU, and beyond the institution. Additionally, the requested Estrelas DRIE instrument will expand the existing micro/nanomanufacturing capabilities at MSU and serve the needs of broad micro/nanoscale science, engineering, and technology. By accelerating these state-of-the-art research areas, the instrument will also serve as an important tool to create scientific training and artistic works to attract students, especially from the underrepresented groups, to pursue STEM education and research.This award reflects NSF's statutory mission and has been deemed worthy of support through evaluation using the Foundation's intellectual merit and broader impacts review criteria.

摘要密歇根州立大学（MSU）在进行快速增长的尖端多学科研究领域方面保持着强大的传统和持续的趋势，这些领域对2022年芯片和科学法案以及关键和新兴技术的成功至关重要，如半导体，微电子，能源，传感器，生物医学技术，该项目寻求请求牛津PlasmaPro 100 Estrelas深反应离子蚀刻（DRIE）系统-目标精度，快速，灵活，高纵横比深硅蚀刻，以创造不同的微/纳米结构，以加速这些前沿研究领域在密歇根州立大学和中西部密歇根州。Estrelas DRIE仪器是一种独特的尖端深硅蚀刻系统，具有出色的灵活性和生产能力，可在快速（蚀刻速率28 µm/min）和高纵横比（70：1）的半导体上制造各种微/纳米结构。该仪器将被安置在电气和计算机工程研究洁净室（ERC），这是一个多学科共享的研究设施，可供MSU和外部用户使用。有了Estrelas DRIE，密歇根州立大学将成为一个区域中心，为密歇根州立大学的用户以及密歇根州中西部的其他机构和当地公司提供先进和灵活的半导体加工支持。该仪器将立即受益于来自密歇根州立大学4个不同部门和2个学院的多元化研究团队及其跨学科研究项目，以及其他机构，包括弗劳恩霍夫美国中心中西部，内华达州大学拉斯维加斯和布法罗大学。相关研究预计将产生大量专利，并将其转化为实际应用。除了研究的好处，Estrelas DRIE将作为培训跨学科研究人员和工程师在半导体，微/纳米工程，生物技术，能源，物理学，环境科学等教育工具，要求Estrelas DRIE将刺激密歇根州立大学的快速发展的研究领域的发展，包括半导体，微电子，能源，传感器，生物医学技术，所要求的Estrelas DRIE的能力将在以下主要领域开辟许多新的研究途径：（1）宽带隙半导体：金刚石半导体纳米膜转移以创建金刚石GaN功率器件;（2）可再生能源收集和存储：（3）传感器、MEMS和系统：VO 2薄膜涂层MEMS分光光度计，用于将光束重新定向到不同的地方;（4）传感器、MEMS和系统：VO 2薄膜涂层MEMS分光光度计，用于将光束重新定向到不同的地方;（4）生物医学技术：用于与大脑和神经系统无缝通信的微型神经植入物;用于评估大量神经元的高带宽硅基神经探针;用于监测个人暴露于空气中的微流体系统;（5）量子技术：金刚石纳米柱作为量子信息的载体，提高光子提取效率;金刚石膜用于量子应用。要求Estrelas DRIE是一个必不可少的使能工具，不仅将解决一个不同的研究人员群体的迫切需要，以加快他们当前/未来的研究，但也促进工程师和科学家之间的多学科合作部门内，整个密歇根州立大学，并超越机构。此外，所要求的Estrelas DRIE仪器将扩展MSU现有的微/纳米制造能力，并满足广泛的微/纳米科学，工程和技术的需求。通过加速这些最先进的研究领域，该仪器还将作为一个重要的工具，创造科学培训和艺术作品，以吸引学生，特别是来自代表性不足的群体，追求STEM教育和研究。该奖项反映了NSF的法定使命，并已被认为是值得通过评估使用基金会的智力价值和更广泛的影响审查标准的支持。