MRI: Acquisition of a Research Grade Ion Implanter for Research and Education in Ion Beam Modification of Materials

该提案旨在购买一台新的400千伏研究级离子注入机，以取代老化的200千伏商用设备，并显著扩大其能力。在过去的10年里，来自密歇根大学、其他大学和工业界的30多个研究小组使用了目前的离子注入器。这项研究已经发表了几十篇出版物，其中一些在项目描述中被引用。超过40名研究生在他们的论文研究中使用了植入器。新的植入器将成为校园内14个研究项目的重要组成部分，特别是在1)金属和陶瓷中的纳米颗粒形成，2)半导体纳米结构和异质结构，3)原子和分子结构修饰以及4)生物医学设备材料等领域。它还将在通过密歇根节点向NSF国家纳米技术基础设施网络（NNIN）的用户提供表面改性能力方面发挥主导作用。这台仪器将支持28名教职员工的研究项目，他们横跨大学9个系（材料科学与工程、核工程与放射科学、生物医学工程、电子工程与计算机科学、机械工程、航空航天工程、物理、化学和地质科学），以及其他5所大学(密歇根州立大学、韦恩州立大学、俄亥俄州立大学、美国阿肯色州、科克大学)，涉及55名研究生、本科生和博士后，不包括NNIN的参与。提案叙述中概述的项目是UM依赖于MIBL离子注入的一些主要研究项目。离子注入是一种利用一束带电原子（离子）将一种新的原子类型引入材料的技术。这种方法广泛应用于半导体工业，是制造所有现代电子设备的基本工具。这项提案资助的新植入器将允许九个不同部门的研究人员介绍学生使用该仪器进行研究。我们正在取代一种较早的工具，它已经运作多年，而且非常富有成效，但现在已经过时了。数十名学生接受了早期仪器的训练，一系列非常广泛的研究项目也开始了。我们将把这项工作扩展到更广泛的受众，包括与其他5所大学合作，并正在开展涉及55名研究生、本科生和博士后的研究项目。新的植入器将通过NASA暑期高中学徒计划（SHARP）在几个专门针对本科生和高中生的教育项目中使用。

This proposal is for the acquisition of a new 400 kV, research-grade ion implanter to replace an aging 200 kV commercial unit and to significantly expand capability. In the past 10 years, over 30 research groups, from within the U of M, other universities and industry have used the current ion implanter. This research has resulted in dozens of publications, some of which are referenced in the project description. Over 40 graduate students have used the implanter for a significant portion of their thesis research. The new implanter will be an essential part of 14 research programs across campus, especially in the areas of 1) nanoparticle formation in metals and ceramics, 2) semiconductor nanostructures and heterostructures, 3) atomic and molecular structure modification, and 4) biomedical device materials. It will also play the lead role in providing surface modification capability to users of the NSF National Nanotechnology Infrastructure Network (NNIN) through the Michigan node. This instrument will support research programs of 28 faculty spanning 9 departments across the University (Materials Science & Engineering, Nuclear Engineering and Radiological Sciences, Biomedical Engineering, Electrical Engineering and Computer Sciences, Mechanical Engineering, Aerospace Engineering, Physics, Chemistry, and Geological Sciences), 5 other universities (Michigan State University, Wayne State University, Ohio State, U. Arkansas, University of Cork) and involving 55 graduate students, undergraduate students and post-docs, not including participation from NNIN. The programs outlined in the proposal narrative are some of the principal research programs at UM relying on ion implantation at MIBL. Ion implantation is a technique of using a beam of charged atoms (ions) to introduce a new atomic type into a material. This method is widely used in the semiconductor industry, where it is a fundamental tool in fabricating all modern electronic devices. The new implanter funded in this proposal will allow researchers in nine different departments to introduce students to research using this instrument. We are replacing an earlier instrument that has been operational for years, and very productive, but which is now obsolete. Dozens of students have been trained with the earlier instrument and a very broad set of research programs started. We will extend that work to an even wider audience, including collaborations with 5 other universities, and have research programs underway that involve 55 graduate, undergraduate and postdoctoral students. The new implanter will be used in several educational programs specifically aimed at undergraduate and high schools students trhough the NASA Summer High School Apprenticeship Program (SHARP).